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Multiuser equipment approved in grant 2012/50259-8: reactive ion etching

Grant number: 18/23377-6
Support type:Multi-user Equipment Program
Duration: December 01, 2018 - November 30, 2025
Field of knowledge:Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Measurements, Instrumentation
Principal Investigator:Antonio Helio de Castro Neto
Grantee:Antonio Helio de Castro Neto
Home Institution: Centro de Pesquisas Avançadas em Grafeno, Nanomateriais e Nanotecnologia (MackGrafe). Universidade Presbiteriana Mackenzie (UPM). Instituto Presbiteriano Mackenzie. São Paulo , SP, Brazil
Associated research grant:12/50259-8 - Graphene: photonics and opto-electronics: UPM-NUS collaboration, AP.SPEC
As informações de acesso ao Equipamento Multiusuário são de responsabilidade do Pesquisador responsável
EMU web page:
Tipo de equipamento:Processos Físicos - Modificação superfícies – etching - Feixes iônicos
Fabricante: Reactive Ion-Etcher (RIE)
Modelo: Reactive Ion-Etcher (RIE)


This equipment allows the manufacture of electro-optical devices using thin film deposition technique of atomic thickness. With it, it will be possible to deposit dielectric layers of the order of a few nanometers in capacitive structures based on two-dimensional materials. (AU)