Multiuser equipment approved in grant 2012/50259-8: reactive ion etching

• Grant number: 18/23377-6
• Support Opportunities: Multi-user Equipment Program
• Start date: December 01, 2018
• End date: November 30, 2025
• Field of knowledge: Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Measurements, Instrumentation
• Principal Investigator: Eunezio Antonio de Souza
• Grantee: Eunezio Antonio de Souza
• Host Institution: Instituto Mackenzie de Pesquisas em Grafeno e Nanotecnologias. Universidade Presbiteriana Mackenzie (UPM). Instituto Presbiteriano Mackenzie. São Paulo , SP, Brazil
• Associated research grant: 12/50259-8 - Graphene: photonics and opto-electronics: UPM-NUS collaboration, AP.SPEC
• EMU web page: https://www.mackenzie.br/mackgraphe/laboratorio-multiusuario
• Type of equipment: Processos Físicos - Modificação superfícies – etching - Feixes iônicos
• Manufacturer: Reactive Ion-Etcher (RIE)
• Model: Reactive Ion-Etcher (RIE)

Abstract

This equipment allows the manufacture of electro-optical devices using thin film deposition technique of atomic thickness. With it, it will be possible to deposit dielectric layers of the order of a few nanometers in capacitive structures based on two-dimensional materials. (AU)