Advanced search
Start date

Multiuser equipment approved in grant 2012/50259-8: reactive ion etching

Grant number: 18/23377-6
Support Opportunities:Multi-user Equipment Program
Duration: December 01, 2018 - November 30, 2025
Field of knowledge:Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Measurements, Instrumentation
Principal Investigator:Eunezio Antonio de Souza
Grantee:Eunezio Antonio de Souza
Host Institution: Instituto Mackenzie de Pesquisas em Grafeno e Nanotecnologias. Universidade Presbiteriana Mackenzie (UPM). Instituto Presbiteriano Mackenzie. São Paulo , SP, Brazil
Associated research grant:12/50259-8 - Graphene: photonics and opto-electronics: UPM-NUS collaboration, AP.SPEC
As informações de acesso ao Equipamento Multiusuário são de responsabilidade do Pesquisador responsável
EMU web page:
Type of equipment:Processos Físicos - Modificação superfícies – etching - Feixes iônicos
Manufacturer: Reactive Ion-Etcher (RIE)
Model: Reactive Ion-Etcher (RIE)


This equipment allows the manufacture of electro-optical devices using thin film deposition technique of atomic thickness. With it, it will be possible to deposit dielectric layers of the order of a few nanometers in capacitive structures based on two-dimensional materials. (AU)

Articles published in Agência FAPESP Newsletter about the research grant:
Articles published in other media outlets (0 total):
More itemsLess items

Please report errors in scientific publications list using this form.