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15th International Conference on Atomic Layer Deposition

Articles published in Agência FAPESP Newsletter about the research grant:
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VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)

Scientific publications (9)
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
CHIAPPIM, W.; TESTONI, G. E.; DORIA, A. C. O. C.; PESSOA, R. S.; FRAGA, M. A.; GALVAO, N. K. A. M.; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O-2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology, v. 27, n. 30, . (11/50773-0, 15/05956-0, 15/10876-6)
DIAS, VANESSA; MACIEL, HOMERO; FRAGA, MARIANA; LOBO, ANDERSON O.; PESSOA, RODRIGO; MARCIANO, FERNANDA R.. Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application. MATERIALS, v. 12, n. 4, . (14/18139-8, 11/50773-0, 11/17877-7, 12/15857-1, 11/20345-7, 16/00575-1, 15/05956-0, 15/09697-0, 18/01265-1, 15/10876-6)
CHIAPPIM, W.; TESTONI, G. E.; MORAES, R. S.; PESSOA, R. S.; SAGAS, J. C.; ORIGO, F. D.; VIEIRA, L.; MACIEL, H. S.. Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass. VACUUM, v. 123, p. 91-102, . (11/50773-0, 15/05956-0)
CHIAPPIM, W.; TESTONI, G. E.; DORIA, A. C. O. C.; PESSOA, R. S.; FRAGA, M. A.; GALVAO, N. K. A. M.; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O-2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology, v. 27, n. 30, p. 15-pg., . (11/50773-0, 15/05956-0, 15/10876-6)
CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)
TESTONI, G. E.; CHIAPPIM, W.; PESSOA, R. S.; FRAGA, M. A.; MIYAKAWA, W.; SAKANE, K. K.; GALVAO, N. K. A. M.; VIEIRA, L.; MACIEL, H. S.. Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties. JOURNAL OF PHYSICS D-APPLIED PHYSICS, v. 49, n. 37, . (11/50773-0, 15/05956-0)
CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . (11/50773-0, 15/05956-0)
PESSOA, R. S.; DOS SANTOS, V. P.; CARDOSO, S. B.; DORIA, A. C. O. C.; FIGUEIRA, F. R.; RODRIGUES, B. V. M.; TESTONI, G. E.; FRAGA, M. A.; MARCIANO, F. R.; LOBO, A. O.; et al. TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process. Applied Surface Science, v. 422, p. 73-84, . (11/50773-0, 12/15857-1, 11/17877-7, 11/20345-7, 15/10876-6, 15/09697-0, 15/08523-8, 16/00575-1, 15/05956-0)
RODRIGUES, BRUNO V. M.; DIAS, VANESSA M.; FRAGA, MARIANA A.; DA SILVA SOBRINHO, ARGEMIRO S.; LOBO, ANDERSON O.; MACIEL, HOMERO S.; PESSOA, RODRIGO S.. Atomic layer deposition of TiO2 thin films on electrospun poly (butylene adipate-co-terephthalate) fibers: Freestanding TiO2 nanostructures via polymer carbonization. MATERIALS TODAY-PROCEEDINGS, v. 14, p. 7-pg., . (15/10876-6, 17/18826-3, 15/09697-0, 11/50773-0, 12/15857-1, 11/20345-7, 16/00575-1, 15/05956-0, 18/01265-1)