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Deposition of diamond-like carbon films on metal substrates by plasma immersion ion implantation technique

Grant number: 05/03438-0
Support type:Scholarships in Brazil - Master
Effective date (Start): September 01, 2006
Effective date (End): July 13, 2008
Field of knowledge:Engineering - Electrical Engineering - Electrical Materials
Principal Investigator:Mario Ueda
Grantee:Lilian Hoshida
Home Institution: Instituto Tecnológico de Aeronáutica (ITA). Ministério da Defesa (Brasil). São José dos Campos , SP, Brazil


Diamond-like carbon (DLC) films are a part of a family of materials called advanced materials, because they possess physical and chemical properties that make it possible to be used in a great variety of applications with high added value. Their explored properties include high wear resistance, low friction coefficient, chemical inertness, infrared transparency, high electrical resistance and low dielectric constant.The DLC films will be deposited on metallic substrates, such as the stainless steel, aluminum alloys and titanium alloys by means of the technique of plasma immersion ion implantation (PIII) using the methane and acetylene gases. Hybrid treatments composing the PIII with magnetron sputtering of carbon targets will be carried out also, controlling the hydrogen content inside the film and consequently the hardness of the deposited material.After the deposition of the films, characterizations including its structural, morphological, mechanical and tribological properties will be carried out, using the techniques such as: Raman spectroscopy, AFM, RBS, profiler and pin-on-disc. The treatments for PIII and PIII + magnetron sputtering will be carried out in the Associated Plasma Laboratory (LAP) of INPE, and the characterizations mentioned above in laboratories with which the group of LAP maintains scientific cooperation. (AU)

Academic Publications
(References retrieved automatically from State of São Paulo Research Institutions)
HOSHIDA, Lilian. Deposição de filmes de carbono tipo diamante sobre substratos metálicos por meio da técnica de implantação iônica por imersão em plasma. 2009. 110 f. Master's Dissertation - Brasil. Ministério da Defesa. Comando-Geral de Tecnologia Aeroespacial (CTA). Instituto Tecnológico de Aeronáutica (ITA) São José dos Campos.

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