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High power impulse magnetron sputtering - HiPIMS for Ag-DLC film production

Grant number: 10/10351-7
Support type:Scholarships in Brazil - Doctorate
Effective date (Start): November 01, 2010
Effective date (End): August 31, 2013
Field of knowledge:Engineering - Materials and Metallurgical Engineering
Principal Investigator:Lúcia Vieira
Grantee:Sara Fernanda Fissmer
Home Institution: Divisão de Ciências Fundamentais (IEF). Instituto Tecnológico de Aeronáutica (ITA). Ministério da Defesa (Brasil). São José dos Campos , SP, Brazil

Abstract

In this work is proposed the study of inserting silver particles in DLC films through plasma-assisted techniques with goal of studying DLC reduction rate in atomic oxygen and also compare the tribological properties, such as the friction coefficient and wear of DLC films with and without silver nanoparticles. Mechanical properties, such as adhesion, of DLC deposited on metallic substrates will be studied due to high internal and external stress. To improve the adhesion will be used Physical vapour deposition assisted by High Power Impulse Magnetron Sputtering - HiPIMS. This is a technique recently developed for deposition of thin films via magnetron sputtering uses highly ionized plasmas. This will be possible to establish unique conditions for the growth films with superior properties then conventional sputtering, so high compression level, defects free, high substrates adhesion among others. The silver nanoparticles distribution will be studied on the DLC in relation of nucleating, coalescence and grains shapes. (AU)