Scholarship 18/00303-7 - Cristalografia - BV FAPESP
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ADVANCED METHODS FOR STUDYING OF MATERIALS BY DIFFRACTION AND SCATTERING OF X-RAYS

Grant number: 18/00303-7
Support Opportunities:Scholarships abroad - Research
Start date: June 04, 2018
End date: August 30, 2018
Field of knowledge:Physical Sciences and Mathematics - Physics - Condensed Matter Physics
Principal Investigator:Sérgio Luiz Morelhão
Grantee:Sérgio Luiz Morelhão
Host Investigator: Stefan Walenty Kycia
Host Institution: Instituto de Física (IF). Universidade de São Paulo (USP). São Paulo , SP, Brazil
Institution abroad: University of Guelph, Canada  

Abstract

X-ray crystallography is the most awarded area in applied physics due to the importance of studying the atomic structure of materials and biological systems. With the advent of new x-ray sources, as well as materials and devices from new technologies, the need of developing new methodologies and preparing graduated researchers with depth knowledge of x-ray diffraction and scattering processes have become increasingly imperative in researches of high impact factor wordwide. For example, in the last two years only there are works on several areas: new magnetic materials [1], optoelectronic devices [2], epitaxial films of magnetic materials [3] and topological insulators [4-8], amino acid crystals with structural changes [9] and, more recently, focusing optics for high energy x-rays [10], multidetector panels for x-ray microscopy [11], and materials with strongly correlated electrons [12]. These works come from a great synergy between many areas of knowledge, aggregating researchers from national and international institutes, but mainly from the computational resources and procedures in X-ray crystallography that we have developed over the years. In terms of the training of researchers, the works listed here have contributed to the formation of seven researchers: Guilherme Galligaris (PhD, CNPq), Hardeep Kumar (postdoc, FAPESP), Celso I. Fornari (postdoc, FAPESP), Gabriel Dina (PhD, UofG), Scott Annett (PhD, UofG), Samuel Netzke (scientific initiation, UofG), and Marli dos Reis Cantarino (PhD, IFUSP). The requested internship of three-month (June, July and August) at the University of Guelph, ON, Canada, aims to continue collaboration on the use of high-flux in-house souces to improve new methodologies in X-ray crystallography. We will be working on data collection, supervision of graduated students, and elaboration of computational resources essential in the preparation of experiments, as well as in the analysis of the data. The frequent contact of the students with complex crystallographic methods and using equipments very similar to those found in large laboratories (synchrotrons) generate an invaluable know-how in the face of today's reality, where more and more cutting edge researches rely on these large laboratories. With this internship, we also intend to pave the way for a greater exchange of students among the research groups of the involved institutions.

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Scientific publications (4)
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
FORNARI, CELSO I.; ABRAMOF, EDUARDO; RAPPL, PAULO H. O.; KYCIA, STEFAN W.; MORELHAO, SERGIO L.. Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. MRS ADVANCES, v. 5, n. 35-36, SI, p. 1891-1897, . (18/00303-7, 16/22366-5)
MORELHAO, SERGIO L.; KYCIA, STEFAN W.; NETZKE, SAMUEL; FORNARI, CELSO I.; RAPPL, PAULO H. O.; ABRAMOF, EDUARDO. Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. Journal of Physical Chemistry C, v. 123, n. 40, p. 24818-24825, . (18/00303-7, 16/22366-5)
VALERIO, ADRIANA; PENACCHIO, RAFAELA F. S.; ESTRADIOTE, MAURICIO B.; CANTARINO, MARLI R.; GARCIA, FERNANDO A.; MORELHAO, SERGIO L.; RAFTER, NIAMH; KYCIA, STEFAN W.; CALLIGARIS, GUILHERME A.; REMEDIOS, CLAUDIO M. R.. Phonon scattering mechanism in thermoelectric materials revised via resonant x-ray dynamical diffraction. MRS COMMUNICATIONS, v. 10, n. 2, p. 265-271, . (18/00303-7, 19/15574-9, 19/11564-9)
FORNARI, CELSO I.; ABRAMOF, EDUARDO; RAPPL, PAULO H. O.; KYCIA, STEFAN W.; MORELHAO, SERGIO L.. Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. MRS ADVANCES, v. 5, n. 35-36, p. 7-pg., . (18/00303-7, 16/22366-5)

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