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MULTICHANNELS fabrication for development of high performance processes involving heat transfer with phase change applied to solar energy use

Grant number: 18/23538-0
Support type:Scholarships in Brazil - Post-Doctorate
Effective date (Start): February 01, 2019
Effective date (End): January 31, 2021
Field of knowledge:Engineering - Electrical Engineering
Principal Investigator:Gherhardt Ribatski
Grantee:Valter Salles do Nascimento Junior
Home Institution: Escola de Engenharia de São Carlos (EESC). Universidade de São Paulo (USP). São Carlos , SP, Brazil
Associated research grant:16/09509-1 - Phase change heat transfer processes of high performance applied to solar energy recovery, AP.TEM

Abstract

A focus of this position is to develop a new geometrical configuration of a radiation/heat absorber and to investigate the MULTICHANNELS FABRICATION FOR DEVELOPMENT OF HIGH PERFORMANCE PROCESSES INVOLVING HEAT TRANSFER WITH PHASE CHANGE APPLIED TO SOLAR ENERGY USE. For this purpose, dry etching processes, which are mandatories to get the microchannels, with depth values from tens to hundreds of micrometers, will used. The BOSCH process, using high density plasma generated by Inductively Coupled Plasma (ICP), will be the principal dry etching step for microchannels fabrication in silicon substrates. Furthermore, many silicon microfabrication processes will be carried out, such as: metal and dielectric depositions, lithography and substrate cleanning.