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Development and characterization of Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment for thin films deposition with titanium by radio frequency plasma

Grant number: 07/02959-2
Support type:Scholarships in Brazil - Scientific Initiation
Effective date (Start): August 01, 2007
Effective date (End): November 30, 2007
Field of knowledge:Physical Sciences and Mathematics - Physics - Condensed Matter Physics
Principal researcher:Fernando Alvarez
Grantee:Daniel Lima Monteiro
Home Institution: Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil

Abstract

During this project, will be developed a PECVD system for deposition of thin films of TiN using alcoxides cantaining Ti, by radiofrequency plasma. After this, the equipment will be improved and characterized in order to obtain control over the quantity of oxygen present to achieve more quality films.

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