Currently he is an Associate Professor based at the Technological Plasmas Laboratory, UNESP, Sorocaba, SP, Brazil. He has professional experience in physics and analytical chemistry. Research interests include the following: Physics of solids and surfaces; PECVD and the characterization of thin films; materials analysis using IRS, XPS, UVS and similar techniques. Graduate in Physics (Hons) from Birmingham University (1981), Masters in Medical Physics from the University of Surrey (1986) and Doctor in Mass spectrometry, University of Surrey (1989). Livre Docente in The Science and Technology of Thin Films (UNESP, 2020). ResearcherID C-1048-2012 Orcid: 0000-0002-4511-3768 (Source: Lattes Curriculum)
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Protective hydrophobic, self-cleaning transparent layers may be applied to glass used in windows. Thus, the treated window is protected, and contamination such as particles or other detritus tend to be taken away, for example, by rain droplets, which run down the vertical pane under the action of gravity. For such functions the protective layer must have good adhesion, mechanical resistan…
The deposition of amorphous chloinated thin films and the chlorination of surfaces in plasmas have diverse applications, amongst others,in biomaterials, the modification of fabric, and in the production of hydrogenated silicon films with excellent electrical characteristics. The present proposal deals first with the production of chlorinated surfaces using plasmas and the study of the che…
Thin hydrogenated carbon films also containing halogens will be produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Immersion Ion Implantation and Deposition (PIIID), a-C:H:X, where X is a halogen, and similar films such as a-C:H:X:Si. The chemical structure and composition of these films will be examined by X-ray Photoelectron Spectrocopy (XPS) and Fourier Transform …
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