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Rodrigo Savio Pessoa

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Ministério da Defesa (Brasil). Instituto Tecnológico de Aeronáutica (ITA). Divisão de Ciências Fundamentais (IEF)  (Institutional affiliation for the last research proposal)
Birthplace: Brazil

Prof. Rodrigo Sávio Pessoa has undergraduate degree in Physics from "Universidade Estadual Paulista Julio de Mesquita Filho, UNESP" (2003), Master of Science degree in the field of Plasma Physics from Technological Institute of Aeronautics (2005) and Doctorate in Sciences in the field of Plasma Physics from Technological Institute of Aeronautics (2009). He is currently research professor at the Instituto Tecnológico de Aeronáutica. He has experience in physics, with emphasis on Condensed Matter Physics and Plasma Physics, Plasma Engineering, Aerospace Engineering and Microelectronics acting on the following topics: thermal and non-thermal plasma technology, plasma diagnostic techniques, deposition processes (Physical Vapor Deposition, Chemical Vapor Deposition) and etching of materials by plasma (Reactive Ion Etching, Inductively Coupled Plasma, Hollow Cathode RIE), surface treatment by plasma (Microwave plasma, Microplasmas), techniques for materials characterization, simulation/modeling of cold plasmas, electron field emission and plasma gasification. He is interested in new types of plasma reactors, new materials and processes for microelectronics, aeronautical/aerospace engineering, micro-electromechanical devices (MEMS), solar cell and nanotechnology. In these themes and related topics Dr. Rodrigo S. Pessoa was supervisor of 11 M. Sc and 9 Ph. D. He has published 98 articles in leading international scientific journals and 22 book chapters, and published more than 300 works in proceedings of national and international conferences. H-index = 15 (Scopus) and H = 18 (Google Scholar). (Source: Lattes Curriculum)

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Scientific publications resulting from Research Grants and Scholarships under the grantee's responsibility (14)

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

Publications15
Citations62
Cit./Article4.1
Data from Web of Science

DE SOUZA, P. R. F.; SOUZA, G. C. C.; PINTO, J. V. F. A.; DORIA, A. C. O. C.; NASCIMENTO, L. M.; GOMES, M. C.; DA SILVA SOBRINHO, A. S.; PETRACONI, G.; SAGAS, J. C.; RODRIGUES, B. V. M.; et al. Effect of Ozone Exposure on Water Uptake and Germination of Lentil (Lens Culinaris) Seeds. OZONE-SCIENCE & ENGINEERING, v. 43, n. 1, . Web of Science Citations: 0. (18/01265-1)

CHIAPPIM, W.; TESTONI, G. E.; MORAES, R. S.; PESSOA, R. S.; SAGAS, J. C.; ORIGO, F. D.; VIEIRA, L.; MACIEL, H. S.. Structural, morphological, and optical properties of TiO2 thin films grown by atomic layer deposition on fluorine doped tin oxide conductive glass. VACUUM, v. 123, p. 91-102, . Web of Science Citations: 19. (15/05956-0, 11/50773-0)

CHIAPPIM, W.; TESTONI, G. E.; DORIA, A. C. O. C.; PESSOA, R. S.; FRAGA, M. A.; GALVAO, N. K. A. M.; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O-2 plasma power, precursor chemistry and plasma exposure mode. Nanotechnology, v. 27, n. 30, . Web of Science Citations: 8. (15/05956-0, 11/50773-0, 15/10876-6)

ANELISE CRISTINA OSÓRIO CESAR DORIA; CAMILA DI PAULA COSTA SORGE; THAISA BAESSO SANTOS; JHONATAN BRANDÃO; POLYANA ALVES RADI GONÇALVES; HOMERO SANTIAGO MACIEL; SÔNIA KHOURI; RODRIGO SÁVIO PESSOA. Application of post-discharge region of atmospheric pressure argon and air plasma jet in the contamination control of Candida albicans biofilms. Res. Biomed. Eng., v. 31, n. 4, p. 358-362, . (11/50773-0, 15/10876-6)

DIAS, VANESSA; MACIEL, HOMERO; FRAGA, MARIANA; LOBO, ANDERSON O.; PESSOA, RODRIGO; MARCIANO, FERNANDA R.. Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application. MATERIALS, v. 12, n. 4, . Web of Science Citations: 1. (16/00575-1, 15/05956-0, 11/50773-0, 14/18139-8, 15/10876-6, 11/20345-7, 15/09697-0, 12/15857-1, 11/17877-7, 18/01265-1)

DIAS, V. M.; CHIAPPIM, W.; FRAGA, M. A.; MACIEL, H. S.; MARCIANO, F. R.; PESSOA, R. S.. Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage. MATERIALS RESEARCH EXPRESS, v. 7, n. 7, . Web of Science Citations: 0. (18/01265-1, 14/18139-8, 16/17826-7)

CHIAPPIM, WILLIAM; TESTONI, GIORGIO; MIRANDA, FELIPE; FRAGA, MARIANA; FURLAN, HUMBER; SARAVIA, DAVID ARDILES; SOBRINHO, ARGEMIRO DA SILVA; PETRACONI, GILBERTO; MACIEL, HOMERO; PESSOA, RODRIGO. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating. MICROMACHINES, v. 12, n. 6, . Web of Science Citations: 0. (18/01265-1, 20/10450-7)

CHIAPPIM, WILLIAM; SAMPAIO, ALINE DA GRACA; MIRANDA, FELIPE; FRAGA, MARIANA; PETRACONI, GILBERTO; DA SILVA SOBRINHO, ARGEMIRO; KOSTOV, KONSTANTIN; KOGA-ITO, CRISTIANE; PESSOA, RODRIGO. Antimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albicans. WATER, v. 13, n. 11, . Web of Science Citations: 0. (20/10450-7, 19/25652-7, 18/01265-1, 19/05856-7)

CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . Web of Science Citations: 11. (15/05956-0, 11/50773-0)

GALVAO, NIERLLY; VASCONCELOS, GETULIO; PESSOA, RODRIGO; MACHADO, JOAO; GUERINO, MARCIEL; FRAGA, MARIANA; RODRIGUES, BRUNO; CAMUS, JULIEN; DJOUADI, ABDOU; MACIEL, HOMERO. A Novel Method of Synthesizing Graphene for Electronic Device Applications. MATERIALS, v. 11, n. 7, . Web of Science Citations: 1. (18/01265-1, 14/18139-8, 17/18826-3, 11/50773-0)

PESSOA, R. S.; DOS SANTOS, V. P.; CARDOSO, S. B.; DORIA, A. C. O. C.; FIGUEIRA, F. R.; RODRIGUES, B. V. M.; TESTONI, G. E.; FRAGA, M. A.; MARCIANO, F. R.; LOBO, A. O.; et al. TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process. Applied Surface Science, v. 422, p. 73-84, . Web of Science Citations: 10. (16/00575-1, 15/05956-0, 11/50773-0, 15/10876-6, 11/20345-7, 15/09697-0, 12/15857-1, 11/17877-7, 15/08523-8)

CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . Web of Science Citations: 0. (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)

TESTONI, G. E.; CHIAPPIM, W.; PESSOA, R. S.; FRAGA, M. A.; MIYAKAWA, W.; SAKANE, K. K.; GALVAO, N. K. A. M.; VIEIRA, L.; MACIEL, H. S.. Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties. JOURNAL OF PHYSICS D-APPLIED PHYSICS, v. 49, n. 37, . Web of Science Citations: 11. (15/05956-0, 11/50773-0)

JUNIOR, ARMSTRONG GODOY; PEREIRA, ANDRE; GOMES, MARCILENE; FRAGA, MARIANA; PESSOA, RODRIGO; LEITE, DOUGLAS; PETRACONI, GILBERTO; NOGUEIRA, ADAILTON; WENDER, HEBERTON; MIYAKAWA, WALTER; et al. Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity. CATALYSTS, v. 10, n. 3, . Web of Science Citations: 0. (18/01265-1, 15/06241-5)

TONELI, D. A.; PESSOA, R. S.; ROBERTO, M.; GUDMUNDSSON, J. T.. A global model study of low pressure high density CF4 discharge. PLASMA SOURCES SCIENCE & TECHNOLOGY, v. 28, n. 2, . Web of Science Citations: 1. (18/01265-1, 15/16471-8)

GALVAO, NIERLLY; GUERINO, MARCIEL; CAMPOS, TIAGO; GRIGOROV, KORNELI; FRAGA, MARIANA; RODRIGUES, BRUNO; PESSOA, RODRIGO; CAMUS, JULIEN; DJOUADI, MOHAMMED; MACIEL, HOMERO. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. MICROMACHINES, v. 10, n. 3, . Web of Science Citations: 0. (18/01265-1, 11/50773-0, 14/18139-8)

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