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Ricardo Magnus Osório Galvão

CV Lattes ResearcherID ORCID


Universidade de São Paulo (USP). Instituto de Física (IF)  (Institutional affiliation for the last research proposal)
Birthplace: Brazil

Graduated in Telecommunications Engineering from Federal Fluminense University(1969), Master in Electrical Engineering from State University of Campinas (1972), PhD in Applied Plasma Physics from Massachusetts Institute of Technology (1976) and ?Livre-Docente? in Experimental Physics from University of São Paulo (1983). He is full professor at the Physics Institute of the University of São Paulo. He was director of the Brazilian Center for Physical Research (2004-2011), director of the National Institute for Space Research (2016-2019), president of the Brazilian Physics Society (2013-2016) and member of the Scientific Council of the European Physics Society (2013 -2016). He is a member of the Academy of Sciences of the State of São Paulo and of the Brazilian Academy of Sciences. He main field is plasma physics and controlled nuclear fusion research. (Source: Lattes Curriculum)

Articles published in Pesquisa FAPESP Magazine about the researcher:
Creative turbulence 
High frequency 
Alta frecuencia 
La energía de las estrellas 
Energy from the stars 
News published in Agência FAPESP Newsletter about the researcher
Articles published in other media outlets (0 total):
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Scientific publications resulting from Research Grants and Scholarships under the grantee's responsibility (50)

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

Publications47
Citations229
Cit./Article4.9
Data from Web of Science

PUGLIA, P. G. P. P.; ELFIMOV, A. G.; RUCHKO, L. F.; GALVAO, R. M. O.; GUIMARAES-FILHO, Z.; RONCHI, G.; TEAM, TCABR. Externally driven global Alfven eigenmodes applied for effective mass number measurement on TCABR. Physics of Plasmas, v. 21, n. 12, . Web of Science Citations: 2. (11/50773-0)

TEZANI, L. L.; PESSOA, R. S.; MORAES, R. S.; MEDEIROS, H. S.; MARTINS, C. A.; MACIEL, H. S.; PETRACONI FILHO, G.; MASSI, M.; DA SILVA SOBRINHO, A. S.. Automation of a Mass Flow Controller for Application in Time-Multiplex SF6+CH4 Plasma Etching of Silicon. CONTRIBUTIONS TO PLASMA PHYSICS, v. 52, n. 9, p. 735-743, . Web of Science Citations: 1. (11/50773-0)

ABRÃO CHIARANDA MERIJ; TARCILA SUGAHARA; GISLENE VALDETE MARTINS; ARGEMIRO SOARES DA SILVA SOBRINHO; DANIELI APARECIDA PEREIRA REIS; POLYANA ALVES RADI GONÇALVES; MARCOS MASSI. Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 18, n. 5, p. 904-907, . (11/50773-0)

DE ALMEIDA MARIBONDO GALVAO, NIERLLY KARINNI; DE VASCONCELOS, GETULIO; RIBEIRO DOS SANTOS, MARCOS VALENTIM; BASTOS CAMPOS, TIAGO MOREIRA; PESSOA, RODRIGO SAVIO; GUERINO, MARCIEL; DJOUADI, MOHAMED ABDOU; MACIEL, HOMERO SANTIAGO. Growth and Characterization of Graphene on Polycrystalline SiC Substrate Using Heating by CO2 Laser Beam. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 19, n. 6, p. 1329-1334, . Web of Science Citations: 4. (11/07468-2, 11/50773-0)

EVERTON DINIZ DOS SANTOS; GERSON LUQUETA; RAMU RAJASEKARAN; THAISA BAESSO DOS SANTOS; ANELISE CRISTINA OSORIO CESAR DORIA; POLYANA ALVES RADI; RODRIGO SAVIO PESSOA; LUCIA VIEIRA; HOMERO SANTIAGO MACIEL. Macrophages adhesion rate on Ti-6Al-4V substrates: polishing and DLC coating effects. Res. Biomed. Eng., v. 32, n. 2, p. 144-152, . (11/50773-0, 13/05269-8)

SAGAS, J. C.; MACIEL, H. S.; LACAVA, P. T.. Effects of non-steady state discharge plasma on natural gas combustion: Flammability limits, flame behavior and hydrogen production. FUEL, v. 182, p. 118-123, . Web of Science Citations: 5. (11/50773-0)

ELFIMOV, A. G.. Geodesic mode spectrum modified by the energetic particles in tokamak plasmas. Physics Letters A, v. 378, n. 47, p. 3533-3536, . Web of Science Citations: 5. (11/50773-0)

PESSOA, R. S.; FRAGA, M. A.; SANTOS, L. V.; MASSI, M.; MACIEL, H. S.. Nanostructured thin films based on TiO2 and/or SiC for use in photoelectrochemical cells: A review of the material characteristics, synthesis and recent applications. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v. 29, p. 56-68, . Web of Science Citations: 39. (11/50773-0)

TEZANI, L. L.; PESSOA, R. S.; MACIEL, H. S.; PETRACONI, G.. Chemistry studies of SF6/CF4, SF6/O-2 and CF4/O-2 gas phase during hollow cathode reactive ion etching plasma. VACUUM, v. 106, p. 64-68, . Web of Science Citations: 9. (11/50773-0)

GONICHE, M.; DUMONT, R.; BOURDELLE, C.; DECKER, J.; DELPECH, L.; EKEDAHL, A.; GUILHEM, D.; GUIMARAES-FILHO, Z.; LITAUDON, X.; LOTTE, PH; et al. Advances in long pulse operation at high radio frequency power in Tore Supra. Physics of Plasmas, v. 21, n. 6, . Web of Science Citations: 3. (11/50773-0)

RADI, POLYANA ALVES; TESTONI, GIORGIO ERNESTO; PESSOA, RODRIGO SAVIO; MACIEL, HOMERO SANTIAGO; ROCHA, LUIS AUGUSTO; VIEIRA, LUCIA. Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition. SURFACE & COATINGS TECHNOLOGY, v. 349, p. 1077-1082, . Web of Science Citations: 5. (11/50773-0, 08/05533-9)

GALVAO, NIERLLY; VASCONCELOS, GETULIO; PESSOA, RODRIGO; MACHADO, JOAO; GUERINO, MARCIEL; FRAGA, MARIANA; RODRIGUES, BRUNO; CAMUS, JULIEN; DJOUADI, ABDOU; MACIEL, HOMERO. A Novel Method of Synthesizing Graphene for Electronic Device Applications. MATERIALS, v. 11, n. 7, . Web of Science Citations: 1. (17/18826-3, 11/50773-0, 18/01265-1, 14/18139-8)

PUGLIA, P. G. P.; ELFIMOV, A. G.; ANDRIATI, A. V.; GALVAO, R. M. O.; GUIMARAES-FILHO, Z. O.; RONCHI, G.; RUCHKO, L. F.. Mass number identification by Alfven wave diagnostics in hydrogen and helium plasmas in TCABR. Physics Letters A, v. 380, n. 11-12, p. 1189-1192, . Web of Science Citations: 0. (11/50773-0)

CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . Web of Science Citations: 0. (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)

PESSOA, R. S.; DOS SANTOS, V. P.; CARDOSO, S. B.; DORIA, A. C. O. C.; FIGUEIRA, F. R.; RODRIGUES, B. V. M.; TESTONI, G. E.; FRAGA, M. A.; MARCIANO, F. R.; LOBO, A. O.; et al. TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process. Applied Surface Science, v. 422, p. 73-84, . Web of Science Citations: 10. (16/00575-1, 15/08523-8, 15/09697-0, 11/17877-7, 11/50773-0, 12/15857-1, 15/05956-0, 15/10876-6, 11/20345-7)

TESTONI, G. E.; CHIAPPIM, W.; PESSOA, R. S.; FRAGA, M. A.; MIYAKAWA, W.; SAKANE, K. K.; GALVAO, N. K. A. M.; VIEIRA, L.; MACIEL, H. S.. Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties. JOURNAL OF PHYSICS D-APPLIED PHYSICS, v. 49, n. 37, . Web of Science Citations: 11. (15/05956-0, 11/50773-0)

MENDONCA, J. T.; FEDELE, R.. Photon mirror acceleration in the quantum regime. Physics of Plasmas, v. 21, n. 12, . Web of Science Citations: 1. (11/50773-0)

DUARTE, V. N.; CLEMENTE, R. A.; FARENGO, R.. Traveling wave current drive theory for an arbitrary m-polar configuration. Physics of Plasmas, v. 20, n. 3, . Web of Science Citations: 0. (12/22830-2, 09/11835-0)

CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . Web of Science Citations: 11. (15/05956-0, 11/50773-0)

NEVES, D. V. F.; DA SILVA SOBRINHO, A. S.; MASSI, M.; GONZALEZ-CARRASCO, J. L.; LIEBLICH, M.; CARDOSO, K. R.. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications. Thin Solid Films, v. 608, p. 71-78, . Web of Science Citations: 0. (11/50773-0)

DIAS, VANESSA; MACIEL, HOMERO; FRAGA, MARIANA; LOBO, ANDERSON O.; PESSOA, RODRIGO; MARCIANO, FERNANDA R.. Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application. MATERIALS, v. 12, n. 4, . Web of Science Citations: 1. (15/10876-6, 18/01265-1, 11/17877-7, 14/18139-8, 15/09697-0, 11/20345-7, 16/00575-1, 12/15857-1, 11/50773-0, 15/05956-0)

DOWSON, S.; DORLING, S.; SHEIKH, H. K.; BLACKMAN, T.; JONES, G.; GOODYEAR, A.; PUGLIA, P.; BLANCHARD, P.; FASOLI, A.; TESTA, D.; et al. The JET upgraded toroidal Alfven Eigenmode Diagnostic System. FUSION ENGINEERING AND DESIGN, v. 146, n. B, SI, p. 2639-2643, . Web of Science Citations: 0. (11/50773-0)

SANTOS, EVERTON D.; LUQUETA, GERSON R.; ABDALA, JULIA M. A.; RAMU, RAJASEKARAN; ESPOSITO, ELISA; REZENDE, LEANDRO B.; VIEIRA, LUCIA; MILTON, JR., B.. Antimicrobial silver coating using PVD-PECVD system. INDIAN JOURNAL OF FIBRE & TEXTILE RESEARCH, v. 45, n. 2, p. 197-206, . Web of Science Citations: 0. (11/50773-0, 13/05269-8)

CHIAPPIM, WILLIAM; FRAGA, MARIANA AMORIM; MACIEL, HOMERO SANTIAGO; PESSOA, RODRIGO SAVIO. An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique. FRONTIERS IN MECHANICAL ENGINEERING-SWITZERLAND, v. 6, . Web of Science Citations: 0. (11/50773-0, 16/17826-7, 18/01265-1)

CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . Web of Science Citations: 0. (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)

DUARTE, V. N.; CLEMENTE, R. A.; FARENGO, R.. Traveling wave current drive theory for an arbitrary m-polar configuration. Physics of Plasmas, v. 20, n. 3, . Web of Science Citations: 0. (12/22830-2, 09/11835-0)

MENDONCA, J. T.; FEDELE, R.. Photon mirror acceleration in the quantum regime. Physics of Plasmas, v. 21, n. 12, . Web of Science Citations: 1. (11/50773-0)

PUGLIA, P. G. P.; ELFIMOV, A. G.; ANDRIATI, A. V.; GALVAO, R. M. O.; GUIMARAES-FILHO, Z. O.; RONCHI, G.; RUCHKO, L. F.. Mass number identification by Alfven wave diagnostics in hydrogen and helium plasmas in TCABR. Physics Letters A, v. 380, n. 11-12, p. 1189-1192, . Web of Science Citations: 0. (11/50773-0)

NASS, K. C. F.; RADI, P. A.; LEITE, D. M. G.; MASSI, M.; DA SILVA SOBRINHO, A. S.; DUTRA, R. C. L.; VIEIRA, L.; REIS, D. A. P.. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy. SURFACE & COATINGS TECHNOLOGY, v. 284, p. 240-246, . Web of Science Citations: 7. (11/50773-0)

CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . Web of Science Citations: 11. (11/50773-0, 15/05956-0)

MENDONCA, J. T.; HORTON, W.; GALVAO, R. M. O.; ELSKENS, YVES. Transport equations for lower hybrid waves in a turbulent plasma. JOURNAL OF PLASMA PHYSICS, v. 81, n. 2, . Web of Science Citations: 0. (11/50773-0)

MENDONCA, J. T.; HAAS, F.; BRET, A.. Influence of flavor oscillations on neutrino beam instabilities. Physics of Plasmas, v. 21, n. 9, . Web of Science Citations: 2. (11/50773-0)

NEVES, D. V. F.; DA SILVA SOBRINHO, A. S.; MASSI, M.; GONZALEZ-CARRASCO, J. L.; LIEBLICH, M.; CARDOSO, K. R.. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications. Thin Solid Films, v. 608, p. 71-78, . Web of Science Citations: 0. (11/50773-0)

DUARTE, D. A.; MASSI, M.; SAGAS, J. C.; DA SILVA SOBRINHO, A. S.; IRALA, D. R.; FONTANA, L. C.. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control. VACUUM, v. 101, n. SI, p. 200-204, . Web of Science Citations: 4. (11/50773-0)

SEVERO, J. H. F.; RONCHI, G.; GALVAO, R. M. O.; NASCIMENTO, I. C.; GUIMARAES-FILHO, Z. O.; KUZNETSOV, YU. K.; NAVE, M. F. F.; OLIVEIRA, A. M.; DO NASCIMENTO, F.; TENDLER, M.. Investigation of rotation at the plasma edge in TCABR. NUCLEAR FUSION, v. 55, n. 9, . Web of Science Citations: 3. (14/13296-8, 11/50773-0)

TINGUELY, R. A.; PUGLIA, P. G.; FIL, N.; DOWSON, S.; PORKOLAB, M.; DVORNOVA, A.; FASOLI, A.; FITZGERALD, M.; GUILLEMOT, V; HUYSMANS, G. T. A.; et al. Experimental studies of plasma-antenna coupling with the JET Alfven Eigenmode Active Diagnostic. NUCLEAR FUSION, v. 61, n. 2, . Web of Science Citations: 0. (11/50773-0)

STEGEMANN, C.; MORAES, R. S.; DUARTE, D. A.; MASSI, M.. Thermal annealing effect on nitrogen-doped TiO2 thin films grown by high power impulse magnetron sputtering plasma power source. Thin Solid Films, v. 625, p. 49-55, . Web of Science Citations: 7. (11/50773-0)

LEAL, G.; FRAGA, M. A.; RASIA, L. A.; MASSI, M.. Impact of high N-2 flow ratio on the chemical and morphological characteristics of sputtered N-DLC films. SURFACE AND INTERFACE ANALYSIS, v. 49, n. 2, p. 99-106, . Web of Science Citations: 2. (13/17045-7, 11/50773-0, 14/18139-8)

RADI, POLYANA ALVES; TESTONI, GIORGIO ERNESTO; PESSOA, RODRIGO SAVIO; MACIEL, HOMERO SANTIAGO; ROCHA, LUIS AUGUSTO; VIEIRA, LUCIA. Tribocorrosion behavior of TiO2/Al2O3 nanolaminate, Al2O3, and TiO2 thin films produced by atomic layer deposition. SURFACE & COATINGS TECHNOLOGY, v. 349, p. 1077-1082, . Web of Science Citations: 5. (08/05533-9, 11/50773-0)

GALVAO, NIERLLY; VASCONCELOS, GETULIO; PESSOA, RODRIGO; MACHADO, JOAO; GUERINO, MARCIEL; FRAGA, MARIANA; RODRIGUES, BRUNO; CAMUS, JULIEN; DJOUADI, ABDOU; MACIEL, HOMERO. A Novel Method of Synthesizing Graphene for Electronic Device Applications. MATERIALS, v. 11, n. 7, . Web of Science Citations: 1. (14/18139-8, 11/50773-0, 18/01265-1, 17/18826-3)

DUARTE, V. N.; CLEMENTE, R. A.; FARENGO, R.. Traveling wave current drive theory for an arbitrary m-polar configuration. Physics of Plasmas, v. 20, n. 3, . Web of Science Citations: 0. (12/22830-2, 09/11835-0)

CHIAPPIM, W.; TESTONI, G. E.; DE LIMA, J. S. B.; MEDEIROS, H. S.; PESSOA, RODRIGO SAVIO; GRIGOROV, K. G.; VIEIRA, L.; MACIEL, H. S.. Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment. Brazilian Journal of Physics, v. 46, n. 1, p. 56-69, . Web of Science Citations: 11. (15/05956-0, 11/50773-0)

NEVES, D. V. F.; DA SILVA SOBRINHO, A. S.; MASSI, M.; GONZALEZ-CARRASCO, J. L.; LIEBLICH, M.; CARDOSO, K. R.. Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications. Thin Solid Films, v. 608, p. 71-78, . Web of Science Citations: 0. (11/50773-0)

MENDONCA, J. T.; HORTON, W.; GALVAO, R. M. O.; ELSKENS, YVES. Transport equations for lower hybrid waves in a turbulent plasma. JOURNAL OF PLASMA PHYSICS, v. 81, n. 2, . Web of Science Citations: 0. (11/50773-0)

DUARTE, D. A.; MASSI, M.; SAGAS, J. C.; DA SILVA SOBRINHO, A. S.; IRALA, D. R.; FONTANA, L. C.. Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control. VACUUM, v. 101, n. SI, p. 200-204, . Web of Science Citations: 4. (11/50773-0)

SEVERO, J. H. F.; RONCHI, G.; GALVAO, R. M. O.; NASCIMENTO, I. C.; GUIMARAES-FILHO, Z. O.; KUZNETSOV, YU. K.; NAVE, M. F. F.; OLIVEIRA, A. M.; DO NASCIMENTO, F.; TENDLER, M.. Investigation of rotation at the plasma edge in TCABR. NUCLEAR FUSION, v. 55, n. 9, . Web of Science Citations: 3. (11/50773-0, 14/13296-8)

MENDONCA, J. T.; HAAS, F.; BRET, A.. Influence of flavor oscillations on neutrino beam instabilities. Physics of Plasmas, v. 21, n. 9, . Web of Science Citations: 2. (11/50773-0)

NASS, K. C. F.; RADI, P. A.; LEITE, D. M. G.; MASSI, M.; DA SILVA SOBRINHO, A. S.; DUTRA, R. C. L.; VIEIRA, L.; REIS, D. A. P.. Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy. SURFACE & COATINGS TECHNOLOGY, v. 284, p. 240-246, . Web of Science Citations: 7. (11/50773-0)

Academic Publications

(References retrieved automatically from State of São Paulo Research Institutions)

NAJERA, Omar Cipriano Usuriaga. Tomografia de emissão H-alfa no tokamak TCABR. Tese (Doutorado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (01/12131-5

SGALLA, Reneé Jordashe Franco. Efeito de rotação nos fluxos zonais e modos acústicos geodésicos. Dissertação (Mestrado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (07/01214-3

RIBEIRO, Celso. Estudo experimental dos regimes de operação da densidade do plasma no tokamak start e sistemas de diagnósticos. Tese (Doutorado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (92/00825-1

DUARTE, Vinícius Njaim. Dinâmica quase-linear e não-linear de automodos de Alfvén excitados por íons energéticos. Tese (Doutorado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (12/22830-2

MATTA, José Antônio Sevidanes da. Desenvolvimento e caracterização de uma fonte de plasma ECR para deposição de filmes finos. Tese (Doutorado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (96/11951-9

OZONO, Edson Moriyoshi. Desenvolvimento do Sistema de Excitação de Ondas de Alfvén no TCABR. Tese (Doutorado) -  Instituto de Física.  Universidade de São Paulo (USP).  São Paulo.  (96/12525-3

SEGUNDO, Gesil Sampaio Amarante. Análise Numérica do Aquecimento de Plasmas, Geração de Corrente e Fluxo por Ondas de Alfvén no Tokamak TCABR. Tese (Doutorado) -  Instituto de Física (IF/SBI).  Universidade de São Paulo (USP).  São Paulo.  (96/12089-9

Patent applications

APARATO PARA REATOR A PLASMA, PROCESSO DE DEPOSIÇÃO DE REVESTIMENTO DE FILME DE CARBONO PELO USO DO REFERIDO APARATO E CORRESPONDENTE FILME OBTIDO BR1020140323740 - Instituto Tecnológico de Aeronáutica (ITA); Universidade do Vale do Paraíba (UNIVAP). Lucia Vieira; Marcos Massi; Argemiro Soares da Silva Sobrinho; Homero Santiago Maciel; Rodrigo Sávio Pessoa; Sara Fernanda Fissmer; Leandro Lameirão Ferreira; Polyana Alves Radi Gonçalves - December 2014, 23

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