CV Lattes
Ministério da Defesa (Brasil). Instituto Tecnológico de Aeronáutica (ITA). Divisão de Ciências Fundamentais (IEF) (Institutional affiliation from the last research proposal) Birthplace: Brazil
bachelor's at Engenharia Química from Faculdade de Engenharia Química de Lorena (2000), master's at Chemical Engineering from Universidade Estadual de Campinas (2003) and doctorate at Chemical Engineering from Universidade Estadual de Campinas (2009). Has experience in Chemical Engineering, acting on the following subjects: hardness, plasticizer, solid rocket propellant, diffusion and thermal insulation. DLC and TiO2 thin films (Source: Lattes Curriculum)
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Silicon dioxide (SiO2) thin films have been used as gate dielectric from many years in the MOS (Metal-Oxide-Semiconductor) - based integrated elements. Even though they have been thoroughly studied during years, the permanently growing demands of the microelectronic industry limit its application because of the increased density of the circuit elements. For thickness of the gate dielectri…
| 1 / 1 | Completed scholarships in Brazil |
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