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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Chemical Vapor Deposition of Monolayer Rhenium Disulfide (ReS2)

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Author(s):
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Keyshar, Kunttal [1] ; Gong, Yongji [2] ; Ye, Gonglan [1] ; Brunetto, Gustavo [3] ; Zhou, Wu [4] ; Cole, Daniel P. [5] ; Hackenberg, Ken [1] ; He, Yongmin [1] ; Machado, Leonardo [3] ; Kabbani, Mohamad [1] ; Hart, Amelia H. C. [1] ; Li, Bo [1] ; Galvao, Douglas S. [3] ; George, Antony [1] ; Vajtai, Robert [1] ; Tiwary, Chandra Sekhar [1] ; Ajayan, Pulickel M. [1]
Total Authors: 17
Affiliation:
[1] Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX 77005 - USA
[2] Rice Univ, Dept Chem, Houston, TX 77005 - USA
[3] State Univ Campinas UNICAMP, IFGW DFA, Dept Appl Phys, BR-13083859 Campinas, SP - Brazil
[4] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 - USA
[5] US Army Res Lab, Vehicle Technol Directorate, Aberdeen Proving Ground, MD 21005 - USA
Total Affiliations: 5
Document type: Journal article
Source: Advanced Materials; v. 27, n. 31, p. 4640-4648, AUG 19 2015.
Web of Science Citations: 109
Abstract

FAPESP's process: 13/08293-7 - CCES - Center for Computational Engineering and Sciences
Grantee:Munir Salomao Skaf
Support type: Research Grants - Research, Innovation and Dissemination Centers - RIDC