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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Simulation of interfacial pH changes during hydrogen evolution reaction

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Author(s):
Carneiro-Neto, Evaldo B. [1, 2] ; Lopes, Mauro C. [1] ; Pereira, Ernesto C. [2]
Total Authors: 3
Affiliation:
[1] Univ Estadual Centro Oeste, LINE, DEQ, BR-85040080 Guarapuava, Parana - Brazil
[2] Univ Fed Sao Carlos, LIEC, DQ, BR-13565905 Sao Paulo - Brazil
Total Affiliations: 2
Document type: Journal article
Source: Journal of Electroanalytical Chemistry; v. 765, p. 92-99, MAR 15 2016.
Web of Science Citations: 11
Abstract

This work investigates the possibility of interfacial pH changes during a hydrogen evolution reaction using a finite elements simulation approach. This reaction is a common side step observed in many electrochemical systems, such as electrodeposition or corrosion. To develop a general approach, different mechanisms, i.e., Volmer/Tafel and Volmer/Heyrovsky, were investigated. It is observed that for V-H mechanism the interfacial pH change increases 4.2 pH units for those cases where the bulk pH is 5.0. Therefore, in this case, the instant pH at the interface become alkaline, although the bulk is still acidic, which could justify parallel reactions such as metal hydroxide formation in metal electrodeposition. Besides, the interfacial pH changes and the corresponding pH profiles were calculated under several experimental conditions including the composition of the metallic electrode, the bulk solution pH and the total buffer concentration UHAI + {[}Al-]. (C) 2015 Elsevier B.V. All rights reserved. (AU)

FAPESP's process: 13/07296-2 - CDMF - Center for the Development of Functional Materials
Grantee:Elson Longo da Silva
Support type: Research Grants - Research, Innovation and Dissemination Centers - RIDC