| Full text | |
| Author(s): |
Malheiros-Silveira, Gilliard N.
[1]
;
Finardi, Celio A.
[2]
;
Burger, Talita S.
[3]
;
Van Etten, Eliana A. M. A.
[3]
;
da Silva, Ricardo C. G.
[3]
;
Coelho, Artur V. P.
[3]
;
Daltrini, Andre M.
[3]
;
Panepucci, Roberto R.
[2]
Total Authors: 8
|
| Affiliation: | [1] Sao Paulo State Univ, UNESP, Campus Sao Joao da Boa Vista, BR-13876750 Sao Paulo - Brazil
[2] Renato Archer Informat Technol Ctr, Hardwam & Syst Design Div, BR-13069901 Campinas, SP - Brazil
[3] CEITEC SA Semicond, Porto Alegre, RS - Brazil
Total Affiliations: 3
|
| Document type: | Journal article |
| Source: | APPLIED OPTICS; v. 58, n. 27, p. 7331-7335, SEP 20 2019. |
| Web of Science Citations: | 0 |
| Abstract | |
We performed an end-to-end process, ranging from design, fabrication, and characterization of integrated polymeric optical devices under a mass production technology. Inverted rib waveguides formed by SU-8 photoresist deposited on top of full wafers, with trenches in silica, were used as a platform to implement such optical devices. Narrowband spectral filters based on microracetrack resonators and diplexers based on directional couplers, both with high extinction ratios, are demonstrated. Full wafers of those devices were processed in a complementary metal-oxide-semiconductor foundry's 150 mm-facility. We believe the results are promising for applications ranging from telecommunication components to sensing devices. (C) 2019 Optical Society of America (AU) | |
| FAPESP's process: | 09/54045-0 - Optical pattern generator for lithography masks and direct write |
| Grantee: | Roberto Ricardo Panepucci |
| Support Opportunities: | Multi-user Equipment Program |
| FAPESP's process: | 13/07559-3 - BRAINN - The Brazilian Institute of Neuroscience and Neurotechnology |
| Grantee: | Fernando Cendes |
| Support Opportunities: | Research Grants - Research, Innovation and Dissemination Centers - RIDC |