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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Electron beam irradiation for the formation of thick Ag film on Ag3PO4

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de Campos da Costa, Joao Paulo [1, 2] ; Assis, Marcelo [1] ; Teodoro, Vinicius [1] ; Rodrigues, Andre [3] ; de Foggi, Camila Cristina [1] ; San-Miguel, Miguel Angel [3] ; Pereira do Carmo, Joao Paulo [2, 4] ; Andres, Juan [5] ; Longo, Elson [1]
Total Authors: 9
[1] Fed Univ Sao Carlos UFSCar, Dept Chem, CDMF, INCTMN, BR-13565905 Sao Carlos - Brazil
[2] Univ Sao Paulo, Dept Elect Engn SEL, BR-13566590 Sao Carlos - Brazil
[3] State Univ Campinas UNICAMP, Inst Chem, Dept Phys Chem, BR-13083970 Campinas, SP - Brazil
[4] Univ Minho, R&D Ctr MicroElectroMech CMEMS, Campus Azurem, P-4800052 Guimaraes - Portugal
[5] Univ Jaume I UJI, Dept Analyt & Phys Chem, Castellon de La Plana 12071 - Spain
Total Affiliations: 5
Document type: Journal article
Source: RSC ADVANCES; v. 10, n. 37, p. 21745-21753, JUN 9 2020.
Web of Science Citations: 0

This study demonstrates that the electron beam irradiation of materials, typically used in characterization measurements, could be employed for advanced fabrication, modification, and functionalization of composites. We developed irradiation equipment using an electron beam irradiation source to be applied in materials modification. Using this equipment, the formation of a thick Ag film on the Ag(3)PO(4)semiconductor is carried out by electron beam irradiation for the first time. This is confirmed by various experimental techniques (X-ray diffraction, field-emission scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy) andab initiomolecular dynamics simulations. Our calculations demonstrate that, at the earlier stages, metallic Ag growth is initiated preferentially at the (110) surface, with the reduction of surface Ag cations forming metallic Ag clusters. As the (100) and (111) surfaces have smaller numbers of exposed Ag cations, the reductions on these surfaces are slower and are accompanied by the formation of O(2)molecules. (AU)

FAPESP's process: 19/18656-6 - Development of electron beam irradiation system and its application in the modification of semiconductor materials
Grantee:João Paulo de Campos da Costa
Support Opportunities: Scholarships in Brazil - Doctorate
FAPESP's process: 13/07296-2 - CDMF - Center for the Development of Functional Materials
Grantee:Elson Longo da Silva
Support Opportunities: Research Grants - Research, Innovation and Dissemination Centers - RIDC
FAPESP's process: 16/23891-6 - Computer modeling of condensed matter
Grantee:Alex Antonelli
Support Opportunities: Research Projects - Thematic Grants