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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Copper removal kinetic from electroplating industry wastewater using pulsed electrodeposition technique

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Nepel, Thayane Carpanedo de Morais [1] ; Costa, Josiel Martins [1] ; Vieira, Melissa Gurgel Adeodato [1] ; de Almeida Neto, Ambrosio Florencio [1]
Total Authors: 4
[1] Univ Estadual Campinas, Sch Chem Engn, Ave Albert Einstein 500, BR-13083852 Campinas, SP - Brazil
Total Affiliations: 1
Document type: Journal article
Web of Science Citations: 0

This study presents a kinetic determination of copper removal from a real jewelry industry wastewater, with removal reaching 82.49% at 37 degrees C, using fast galvanic pulse electrochemical technique in a process lasting 115 min. In the temperature range from 20 to 40 degrees C, the mathematical model of the pseudo-first-order irreversible rate equation, with a correlation coefficient of 0.99, described the process behaviour. In this same temperature range, the Arrhenius' equation described the system, in which the temperature increase favoured the reaction kinetics. The scanning electron microscope (SEM), with energy-dispersive X-ray detector (EDX), X-ray photoelectron spectroscopy (XPS) results, and the mathematical model fitting at the temperatures of 10 and 50 degrees C indicated the formation of copper oxide I. {[}GRAPHICS] . (AU)

FAPESP's process: 17/24887-5 - Metallic Ions Removal of Electroplating Rinse Water by Electroplating to Formation Corrosion Resistant Metal Alloys
Grantee:Ambrósio Florêncio de Almeida Neto
Support type: Regular Research Grants