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Relaxing Graphene Plasmon Excitation Constraints Through the Use of an Epsilon-Near-Zero Substrate

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Author(s):
Alvarenga, Vinicius T. ; Bahamon, Dario A. ; Peres, Nuno M. R. ; de Matos, Christiano J. S.
Total Authors: 4
Document type: Journal article
Source: Plasmonics; v. 18, n. 1, p. 11-pg., 2022-12-26.
Abstract

Graphene plasmons have attracted significant attention due to their tunability, potentially long propagation lengths and ultracompact wavelengths. However, the latter characteristic imposes challenges to light-plasmon coupling in practical applications, generally requiring sophisticated coupling setups, extremely high doping levels and/or graphene nanostructuring close to the resolution limit of current lithography techniques. Here, we propose and theoretically demonstrate a method for alleviating such a technological strain through the use of a practical substrate whose low and negative dielectric function naturally enlarges the graphene polariton wavelength to more manageable levels. We consider silicon carbide (SiC), as it exhibits a dielectric function whose real part is between -1 and 0, while its imaginary part remains lower than 0.05, in the 951 to 970 cm(-1) mid-infrared spectral range. Our calculations show hybridization with the substrate's phonon polariton, resulting in a polariton wavelength that is an order of magnitude longer than obtained with a silicon dioxide substrate, while the propagation length increases by the same amount. (AU)

FAPESP's process: 18/25339-4 - Integrated photonics devices
Grantee:Newton Cesario Frateschi
Support Opportunities: Research Projects - Thematic Grants
FAPESP's process: 15/11779-4 - Plasmonic and nonlinear effects in graphene coupled to optical waveguides
Grantee:Christiano José Santiago de Matos
Support Opportunities: Research Projects - Thematic Grants
FAPESP's process: 18/07276-5 - Mid- and far-infrared plasmonic biosensing with graphene
Grantee:Christiano José Santiago de Matos
Support Opportunities: Regular Research Grants