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(Referência obtida automaticamente do Web of Science, por meio da informação sobre o financiamento pela FAPESP e o número do processo correspondente, incluída na publicação pelos autores.)

Tribomechanical and structural properties of a-SiC:H films deposited using liquid precursors on titanium alloy

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Autor(es):
Nass, K. C. F. [1] ; Radi, P. A. [2] ; Leite, D. M. G. [3] ; Massi, M. [1] ; da Silva Sobrinho, A. S. [3] ; Dutra, R. C. L. [3] ; Vieira, L. [2] ; Reis, D. A. P. [1]
Número total de Autores: 8
Afiliação do(s) autor(es):
[1] Univ Fed Sao Paulo ICT UNIFESP, Sao Paulo - Brazil
[2] Univ Vale Paraiba UNIVAP, Sao Paulo - Brazil
[3] ITA, Sao Paulo - Brazil
Número total de Afiliações: 3
Tipo de documento: Artigo Científico
Fonte: SURFACE & COATINGS TECHNOLOGY; v. 284, p. 240-246, DEC 25 2015.
Citações Web of Science: 8
Resumo

This paper presents a study about deposition parameters with tribological and mechanical properties of a-SiC:H films deposited by PECVD on titanium alloy (Ti-6Al-4V). HMDSO and TMS were used as silicon, carbon, and hydrogen precursors. The deposition temperature and pressure ranged from 400 to 600 degrees C and from 0.5 to 3.0 Torr, respectively. The chemical composition and structural properties of the contained samples were analyzed by XRD, FT-IR, and Raman spectroscopy. The mechanical and tribological properties were evaluated by scratching, nanohardness, friction, and wear tests. The results showed that the films presented amorphous structures, and those obtained with 500 degrees C and 3.0 Torr presented high adhesion and tribological performance. The films grown by using only HMDSO as precursor at 500 degrees C showed the highest deposition rate, higher hardness, good adhesion, and less friction coefficient values. (C) 2015 Elsevier B.V. All rights reserved. (AU)

Processo FAPESP: 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas
Beneficiário:Ricardo Magnus Osório Galvão
Linha de fomento: Auxílio à Pesquisa - Temático