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(Referência obtida automaticamente do Web of Science, por meio da informação sobre o financiamento pela FAPESP e o número do processo correspondente, incluída na publicação pelos autores.)

Growth and surface characterization of FeAlCr thin films deposited by magnetron sputtering for biomedical applications

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Autor(es):
Neves, D. V. F. [1] ; da Silva Sobrinho, A. S. [2] ; Massi, M. [1, 2] ; Gonzalez-Carrasco, J. L. [3, 4] ; Lieblich, M. [3] ; Cardoso, K. R. [1]
Número total de Autores: 6
Afiliação do(s) autor(es):
[1] Univ Fed Sao Paulo, Dept Sci & Technol, 330 Talim St, BR-12231280 Sao Jose Dos Campos, SP - Brazil
[2] Technol Inst Aeronaut ITA, Plasmas & Proc Lab, Dept Phys, BR-12228900 Sao Jose Dos Campos, SP - Brazil
[3] CSIC, Ctr Nacl Invest Met CENIM, Avda Gregorio del Amo 8, E-28040 Madrid - Spain
[4] Ctr Invest Biomed Red Bioingn Biomat & Nanomed, Madrid - Spain
Número total de Afiliações: 4
Tipo de documento: Artigo Científico
Fonte: Thin Solid Films; v. 608, p. 71-78, JUN 1 2016.
Citações Web of Science: 0
Resumo

The limitations of stainless steel as prosthesis material should be overcome in order to better satisfy the required specifications in bone replacements. One strategy to improve the corrosion and wear resistance and diminish the ion release is the surface modification of the implants by protective coatings. In this work, thin films of FeAlCr alloy were grown on ASTM F138 stainless steel by using DC magnetron sputtering technique. The films were produced by varying the sputtering power (from 50 to 200 W) and the substrate temperature (room temperature, 150 degrees C and 300 degrees C). The films obtained in all processing conditions were crystalline and presented the same chemical composition of the target material. It was found that the deposition rate of the films and their adhesion to the substrate increased with both the sputtering power and the substrate temperature. The best result was obtained for depositions carried out at 100 W and substrate heated at 300 degrees C. (C) 2016 Elsevier B.V. All rights reserved. (AU)

Processo FAPESP: 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas
Beneficiário:Ricardo Magnus Osório Galvão
Linha de fomento: Auxílio à Pesquisa - Temático