Copper removal kinetic from electroplating industry wastewater using pulsed electrodeposition technique

Autor(es)

Nepel, Thayane Carpanedo de Morais ^[1] ; Costa, Josiel Martins ^[1] ; Vieira, Melissa Gurgel Adeodato ^[1] ; de Almeida Neto, Ambrosio Florencio ^[1]

Afiliação do(s) autor(es)

^[1] Univ Estadual Campinas, Sch Chem Engn, Ave Albert Einstein 500, BR-13083852 Campinas, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: ENVIRONMENTAL TECHNOLOGY; JUL 2020.
• Citações Web of Science: 0

Resumo

This study presents a kinetic determination of copper removal from a real jewelry industry wastewater, with removal reaching 82.49% at 37 degrees C, using fast galvanic pulse electrochemical technique in a process lasting 115 min. In the temperature range from 20 to 40 degrees C, the mathematical model of the pseudo-first-order irreversible rate equation, with a correlation coefficient of 0.99, described the process behaviour. In this same temperature range, the Arrhenius' equation described the system, in which the temperature increase favoured the reaction kinetics. The scanning electron microscope (SEM), with energy-dispersive X-ray detector (EDX), X-ray photoelectron spectroscopy (XPS) results, and the mathematical model fitting at the temperatures of 10 and 50 degrees C indicated the formation of copper oxide I. {[}GRAPHICS] . (AU)

• Processo FAPESP: 17/24887-5 - Remoção de Íons Metálicos de Água de Enxágue da Galvanoplastia por Meio da Eletrodeposição para Formação de Ligas Metálicas Resistentes à Corrosão
• Beneficiário: Ambrósio Florêncio de Almeida Neto
• Linha de fomento: Auxílio à Pesquisa - Regular