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Evaluating residual stresses in compositionally graded TiN films via ab initio and Rietveld simulation

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Autor(es):
Miscione, Juan Manuel Costa ; da Silva, Felipe Carneiro ; Marcondes, Michel Lacerda ; Petrilli, Helena Maria ; Schon, Claudio Geraldo
Número total de Autores: 5
Tipo de documento: Artigo Científico
Fonte: MATERIALIA; v. 28, p. 17-pg., 2023-02-24.
Resumo

The grazing incidence X-ray diffraction (GIXRD) stress measurement method, based on the classic sin2 psi method, is a well-established procedure for the evaluation of compressive residual stresses (CRS) in thin deposited films. Problems arise when using this approach in single-phase compositionally graded films, since both mechanical and diffraction properties vary with film depth. A method of obtaining CRS gradient was developed which consists in simulating a stressed GIXRD pattern via Rietveld simulation and ab initio obtained X-ray elastic constants (XECs) in order to evaluate the stress profile across the film. This work successfully describes the CRS profile of compositionally graded TiN films obtained by Grid Assisted Magnetron Sputtering (GAMS), insofar as the biaxial stress assumptions are valid and within the limits imposed by the sin2 psi method. (AU)

Processo FAPESP: 19/07661-9 - Instabilidades de rede funcionais em perovskitas naturalmente estruturadas
Beneficiário:Michel Lacerda Marcondes dos Santos
Modalidade de apoio: Bolsas no Brasil - Pós-Doutorado
Processo FAPESP: 18/07760-4 - Instabilidades de rede funcionais em perovskitas naturalmente estruturadas
Beneficiário:Helena Maria Petrilli
Modalidade de apoio: Auxílio à Pesquisa - Regular