Films Deposited from Reactive Sputtering of Aluminum Acetylacetonate Under Low Energy Ion Bombardment

Autor(es)

Darriba Battaglin, Felipe Augusto ; Prado, Eduardo Silva ; Caseli, Luciano ; da Silva, Tiago Fiorini ; Tabacniks, Manfredo Harri ; da Cruz, Nilson Cristino ; Rangel, Elidiane Cipriano

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 20, n. 4, p. 11-pg., 2017-07-01.

Resumo

Films were deposited from aluminum acetylacetonate (Al(acac)(3)) using a methodology involving reactive sputtering and low energy ion bombardment. The plasma was generated by the application of radiofrequency power to the powder containing electrode and simultaneously, negative pulses were supplied to the electrode where the substrates were attached. It was investigated the effect of the duty cycle of the pulses (Delta) on the properties of the coatings. Association of ion bombardment to the deposition process increased film thickness, structure reticulation and organic content. Ions from the deposition environment were implanted at the film-air interface or underneath it. Morphology and topography were altered depending on Delta. Considering the enhancement of Delta, it affected the flux of ions reaching the depositing interface and then the deposition rate, H content, crosslinking degree and surface microstructure. Alumina groups were detected in the infrared spectra, whereas the precipitation of amorphous alumina was confirmed by X-ray diffraction. (AU)

• Processo FAPESP: 12/14708-2 - Processos integrados de plasma para a delineação de padrões superhidrofóbicos na superfície da poliamida
• Beneficiário: Elidiane Cipriano Rangel da Cruz
• Modalidade de apoio: Auxílio à Pesquisa - Regular