Electrochemical behavior of DLC-graphene deposited using a pulsed-DC PECVD with an additional cathode

Autor(es)

Kolawole, Funsho Olaitan ; Vernasqui, Lais Gimenes ; Pillaca, Elver Juan de Dios Mitma ; Magalhaes, William Alex da Silva ; Kolawole, Shola Kolade ; Corat, Evaldo Jose ; Trava-Airoldi, Vladimir Jesus

• Tipo de documento: Artigo Científico
• Fonte: DIAMOND AND RELATED MATERIALS; v. 156, p. 11-pg., 2025-05-03.

Resumo

Graphene incorporated diamond-like carbon (DLC-graphene) films were deposited using pulsed-DC plasma enhanced chemical vapor deposition (PECVD) with an additional cathode system. The effect of graphene incorporation and substrate bias voltage on the microstructure, structural integrity, electrical and electrochemical properties of the DLC-graphene films were investigated by scanning electron microscopy, Raman spectroscopy, a Four-point probe, and in operando Raman spectroscopy during cyclic voltammetry. Graphene inclusion leads to graphene particles on the DLC surface. The Raman spectra show a rise in ID/IG from 0.64 to 1.51 because of an increase in the substrate bias voltage. The electrical resistivity decreased from 34.62 M Omega/m2 to 89 k Omega/m2 as the substrate bias voltage increased. Incorporating graphene improved the electrochemical activity and reversibility of DLC films. The effect of graphene incorporation on the electrical and electrochemical properties of the DLC films were also investigated and the best behavior was obtained for DLC-graphene deposited for two (2) different conditions at bias voltages of 1.0 kV (0.1 mg/mL graphene) and 1.5 kV (0.5 mg/mL graphene). (AU)

• Processo FAPESP: 19/18572-7 - Novos materiais de carbono: suas aplicações espaciais, ambientais e spin offs relevantes
• Beneficiário: Evaldo Jose Corat
• Modalidade de apoio: Auxílio à Pesquisa - Temático
• Processo FAPESP: 23/08065-6 - Estudos dos efeitos da incorporação de nano partículas em filmes de DLC muito espessos
• Beneficiário: Funsho Olaitan Kolawole
• Modalidade de apoio: Bolsas no Brasil - Pós-Doutorado
• Processo FAPESP: 23/06233-9 - Técnicas de caracterização "in situ" e "in operando" em superfícies de materiais de carbono nanoestruturado
• Beneficiário: Laís Gimenes Vernasqui
• Modalidade de apoio: Bolsas no Brasil - Pós-Doutorado