Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Autor(es)

Abrão Chiaranda Merij ^[1] ; Tarcila Sugahara ^[2] ; Gislene Valdete Martins ^[3] ; Argemiro Soares da Silva Sobrinho ^[4] ; Danieli Aparecida Pereira Reis ; Polyana Alves Radi Gonçalves ; Marcos Massi

Afiliação do(s) autor(es)

^[1] Universidade Federal de São Paulo - Brasil

^[2] Universidade Federal de São Paulo - Brasil

^[3] Instituto Tecnológico de Aeronáutica. Departamento de Ciência e Tecnologia Aeroespacial - Brasil

^[4] Instituto Tecnológico de Aeronáutica. Departamento de Ciência e Tecnologia Aeroespacial - Brasil

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 18, n. 5, p. 904-907, 2015-10-00.

Resumo

AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness. (AU)

• Processo FAPESP: 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas
• Beneficiário: Ricardo Magnus Osório Galvão
• Modalidade de apoio: Auxílio à Pesquisa - Temático