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(Referência obtida automaticamente do Web of Science, por meio da informação sobre o financiamento pela FAPESP e o número do processo correspondente, incluída na publicação pelos autores.)

On the surface chemistry and the reuse of sulfur-doped TiO2 films as photocatalysts

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Autor(es):
Bento, Rodrigo T. [1, 2] ; Correa, Olandir V. [1] ; Pillis, Marina F. [1]
Número total de Autores: 3
Afiliação do(s) autor(es):
[1] Univ Sao Paulo, IPEN CNEN SP, Nucl & Energy Res Inst, Prof Lineu Prestes Ave 2242, Sao Paulo - Brazil
[2] Univ Sao Judas Tadeu, Taquari St 546, Sao Paulo - Brazil
Número total de Afiliações: 2
Tipo de documento: Artigo Científico
Fonte: Materials Chemistry and Physics; v. 261, MAR 1 2021.
Citações Web of Science: 0
Resumo

The surface chemistry and recyclability of sulfur-doped titanium dioxide (TiO2) films was evaluated. The photocatalysts were grown by metalorganic chemical vapor deposition (MOCVD) at 400 degrees C. The films were sulfurdoped at 50 degrees C by using hydrogen sulfide (H2S) as sulfur source. The photocatalytic behavior of the films was measure by monitoring the methyl orange dye decolorization under visible light for several cycles. The films are formed only for the anatase crystalline phase. The results demonstrated that no structural modifications or significant differences in the morphology of the films occurred after their use. The sulfur-doped TiO2 films presented good photocatalytic activity, with an efficiency of 72.1% under visible light in its first use. The durability experiments suggest that even with the dye impregnation on the catalyst surface, the photocatalytic activity of the S-doped TiO2 films remained around 70% in the first 3 cycles, which allows their practical application for water treatment and purification under sunlight. (AU)

Processo FAPESP: 05/55861-4 - Projeto, montagem e entrada em operacao de um equipamento mocvd para obtencao de revestimentos micro/nanoestruturados.
Beneficiário:Marina Fuser Pillis
Modalidade de apoio: Auxílio à Pesquisa - Regular