| Texto completo | |
| Autor(es): |
Figueroa, C. A.
;
Wisnivesky, Daniel
[2]
;
Hammer, P.
;
Lacerda, R. G.
;
Droppa, R. Jr
;
Marques, F. C.
;
Alvarez, F.
Número total de Autores: 7
|
| Tipo de documento: | Artigo Científico |
| Fonte: | SURFACE & COATINGS TECHNOLOGY; v. 146-147, p. 405-409, Sept.-Oct. 2001. |
| Área do conhecimento: | Engenharias - Engenharia de Materiais e Metalúrgica |
| Assunto(s): | Resistência dos materiais Tratamento térmico Plasma (estados da matéria) |
| Resumo | |
In this paper we report nitriding studies of stainless steel 316 using a broad ion beam source. Experiments performed by changing the ion energy (0.2-1.5 KeV), ion current density (1.4-5.7 mA/cm2) and implantation times (1 and 8 h) at a temperature around 380°C are reported. The microstructure and morphology are studied by glancing angle X-ray diffraction and scanning electron microscopy. For constant ion energy, higher nitrogen ion flux increases the hardness. At higher ion energies the sputtering process prevents the formation of a thick-nitrated layer, even for longer implantation times. The results are examined in the light of recent studies on physical models for ion implantation. (AU) | |
| Processo FAPESP: | 97/12069-0 - Propriedades estruturais, ópticas e de transporte em semicondutores amorfos |
| Beneficiário: | Fernando Alvarez |
| Modalidade de apoio: | Auxílio à Pesquisa - Temático |