A comprehensive nitriding study by low energy ion beam implantation on stainless steel

Autor(es)

Figueroa, C. A. ; Wisnivesky, Daniel ^[2] ; Hammer, P. ; Lacerda, R. G. ; Droppa, R. Jr ; Marques, F. C. ; Alvarez, F.

• Tipo de documento: Artigo Científico
• Fonte: SURFACE & COATINGS TECHNOLOGY; v. 146-147, p. 405-409, Sept.-Oct. 2001.
• Área do conhecimento: Engenharias - Engenharia de Materiais e Metalúrgica
• Assunto(s): Resistência dos materiais Tratamento térmico Plasma (estados da matéria)

Resumo

In this paper we report nitriding studies of stainless steel 316 using a broad ion beam source. Experiments performed by changing the ion energy (0.2-1.5 KeV), ion current density (1.4-5.7 mA/cm2) and implantation times (1 and 8 h) at a temperature around 380°C are reported. The microstructure and morphology are studied by glancing angle X-ray diffraction and scanning electron microscopy. For constant ion energy, higher nitrogen ion flux increases the hardness. At higher ion energies the sputtering process prevents the formation of a thick-nitrated layer, even for longer implantation times. The results are examined in the light of recent studies on physical models for ion implantation. (AU)

• Processo FAPESP: 97/12069-0 - Propriedades estruturais, ópticas e de transporte em semicondutores amorfos
• Beneficiário: Fernando Alvarez
• Modalidade de apoio: Auxílio à Pesquisa - Temático