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Characterization of glass titanium silicon at different compositions grown by thermal evaporation and sputtering techniques

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Autor(es):
Silva, Heloisa H. P. ; Fiuza, Tanna E. R. ; Portugal, Rodrigo, V ; Leite, Edson R. ; de Farias, Marcelo A. ; Bettini, Jefferson
Número total de Autores: 6
Tipo de documento: Artigo Científico
Fonte: Thin Solid Films; v. 812, p. 9-pg., 2025-01-30.
Resumo

Metallic glasses, in bulk and thin film forms, are of significant interest in scientific research due to their unique properties and wide-ranging engineering applications. Key attributes such as structure, electrical conductivity, surface roughness, mechanical strength, corrosion resistance, and wear resistance determine their potential uses. This study investigates titanium-silicon (TiSi) metallic glass thin films with varying compositions grown via thermal evaporation and sputtering techniques. Comprehensive characterization methods were employed to analyze these films. The composition was determined using energy-dispersive spectroscopy and validated with electron energy loss spectroscopy, which also monitored oxidation processes. Transmission electron microscopy confirmed the films' homogeneity and absence of segregation, such as clusters or nanoparticles. Structural properties were assessed using selected-area electron diffraction and electron pair distribution functions. Thickness and roughness measurements were obtained via atomic force microscopy, while electrical properties were evaluated using the four-probe method. Hydrophobicity was determined through contact angle goniometry with water. This work examines how TiSi thin film properties vary with composition, enabling the design of surface composite materials with tailored functionalities. A specific TiSi composition was identified as suitable for use as a support material in transmission electron microscopy grids. (AU)

Processo FAPESP: 21/10672-2 - Correlacionando catálise e auto-regeneração em cerâmicas: investigação da mobilidade atômica de metais sobre filmes finos de ZrO2 em escala atômica por microscopia eletrônica de transmissão in situ
Beneficiário:Tanna Elyn Rodrigues Fiuza
Modalidade de apoio: Bolsas no Brasil - Pós-Doutorado