Regular and Switching Platform: Bone Stress Analysis With Varying Implant Diameter

Autor(es)

Merson Vargas, Luis Carlos ^[1] ; de Almeida, Erika Oliveira ^[2] ; Rocha, Eduardo Passos ^[2] ; Kina, Sidney ^[1] ; Anchieta, Rodolfo Bruniera ^[2] ; Freitas Junior, Amilcar Chagas ^[2] ; Gomes Franca, Fabiana Mantovani ^[1]

Afiliação do(s) autor(es)

^[1] Sao Leopoldo Mand Sch, Campinas, SP - Brazil

^[2] UNESP Univ Estadual Paulista, Campinas Sch Dent, Campinas, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: JOURNAL OF ORAL IMPLANTOLOGY; v. 39, n. 3, p. 326-332, JUN 2013.
• Citações Web of Science: 4

Resumo

The aim of this study was to evaluate stress distribution of the pen-implant bone by simulating the biomechanical influence of implants with different diameters of regular or platform switched connections by means of 3-dimensional finite element analysis. Five mathematical models of an implant-supported central incisor were created by varying the diameter (5.5 and 4.5 mm, internal hexagon) and abutment platform (regular and platform switched). For the cortical bone, the highest stress values (sigma(max) and sigma(vm)) were observed in situation R1, followed by situations S1, R2, S3, and S2. For the trabecular bone, the highest stress values (sigma(max)) were observed in situation S3, followed by situations R1, S1, R2, and S2. The influence of platform switching was more evident for cortical bone than for trabecular bone and was mainly seen in large platform diameter reduction. (AU)

• Processo FAPESP: 09/09075-8 - Influência do número e inclinação dos implantes para a ancoragem de prótese fixa em maxila atrófica: estudo comparativo com elementos finitos não-linear 3D
• Beneficiário: Erika Oliveira de Almeida
• Modalidade de apoio: Bolsas no Brasil - Doutorado
• Processo FAPESP: 08/00209-9 - Comportamento biomecânico de uma prótese parcial removível classe I mandibular suportada distalmente por um implante osseointegrado: análise tridimensional de elementos finitos
• Beneficiário: Eduardo Passos Rocha
• Modalidade de apoio: Auxílio à Pesquisa - Regular