Thin films produced on 5052 aluminum alloy by plasma electrolytic oxydation with Red Mud-containing Electrolytes

Autor(es)

Lívia Sottovia ^[1] ; Maria Lúcia Pereira Antunes ^[2] ; César Augusto Antonio ^[3] ; Elidiane Cipriano Rangel ^[4] ; Nilson Cristino da Cruz ^[5]

Afiliação do(s) autor(es)

^[1] Universidade Estadual Paulista - Brasil

^[2] Universidade Estadual Paulista - Brasil

^[3] Universidade Estadual Paulista - Brasil

^[4] Universidade Estadual Paulista - Brasil

^[5] Universidade Estadual Paulista - Brasil

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 17, n. 6, p. 1404-1409, 2014-12-00.

Resumo

In this paper, we propose the production of ceramic protective thin films by plasma electrolytic oxidation using red mud-containing electrolytes. The treatments were performed through the application of pulsed voltage (600 V, 200 Hz) during 300 seconds to aluminum samples immersed in electrolytic solutions with 5 g of red mud per liter of distilled water. The coatings were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray energy dispersive spectroscopy (EDS) and contact angle and surface energy measurements. The final current density during the experiments was 0.05 A/cm² and films as thick as 9.0 µm have been obtained. XRD patterns have clearly shown the incorporation of species from the red mud on the coating. (AU)

• Processo FAPESP: 11/23733-8 - Revestimentos cerâmicos protetivos para ligas de alumínio
• Beneficiário: Nilson Cristino da Cruz
• Modalidade de apoio: Auxílio à Pesquisa - Regular