Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy

Autor(es):Mostrar menos -

Woodward, R. I. ^[1] ; Murray, R. T. ^[1] ; Phelan, C. F. ^[2] ; de Oliveira, R. E. P. ^[2] ; Runcorn, T. H. ^[1] ; Kelleher, E. J. R. ^[1] ; Li, S. ^[3] ; de Oliveira, E. C. ^[2] ; Fechine, G. J. M. ^[2] ; Eda, G. ^[3] ; de Matos, C. J. S. ^[2]

Afiliação do(s) autor(es)

^[1] Imperial Coll London, Dept Phys, Femtosecond Opt Grp, London - England

^[2] Univ Prebiteriana Mackenzie, MackGraphe Graphene & Nanomat Res Ctr, Sao Paulo - Brazil

^[3] Natl Univ Singapore, Ctr Adv Mat 2D, Singapore - Singapore

• Tipo de documento: Artigo Científico
• Fonte: 2D MATERIALS; v. 4, n. 1 MAR 2017.
• Citações Web of Science: 52

Resumo

We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of vertical bar chi((2))(s)vertical bar = 2.0 x 10(-20) m(2) V-1 and, for the first time formonolayer MoS2, vertical bar chi((3))(s)vertical bar= 1.7 x 10(-28) m(3) V-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of vertical bar chi((2))(b)vertical bar= 2.9 x 10(-11m). V-1 and vertical bar chi((3))(b)vertical bar= 2.4 x 10(-19) m(2) V-2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating similar to 3.4 times stronger third order sheet nonlinearity inmonolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band. (AU)

• Processo FAPESP: 14/50460-0 - Optical nonlinearity in waveguides and substrates containing graphene and graphene-like materials: a collaboration between the femtosecond Optics Group (fog IC) and the graphene
• Beneficiário: Christiano José Santiago de Matos
• Linha de fomento: Auxílio à Pesquisa - Regular
• Processo FAPESP: 12/50259-8 - Grafeno: fotônica e opto-eletrônica: colaboração UPM-NUS
• Beneficiário: Antonio Helio de Castro Neto
• Linha de fomento: Auxílio à Pesquisa - Programa SPEC
• Processo FAPESP: 15/12734-4 - Design, fabricação e caracterização dos guias de onda ópticos para excitação plasmônica em grafeno
• Beneficiário: Ciaran Phelan
• Linha de fomento: Bolsas no Brasil - Pós-Doutorado
• Processo FAPESP: 15/11779-4 - Efeitos plasmônicos e não-lineares em grafeno acoplado a guias de onda ópticos
• Beneficiário: Christiano José Santiago de Matos
• Linha de fomento: Auxílio à Pesquisa - Temático