Efficient anchor loss suppression in coupled near-field optomechanical resonators

Autor(es)

Luiz, Gustavo O. ^[1] ; Benevides, Rodrigo S. ^[1] ; Santos, Felipe G. S. ^[1] ; Espinel, Yovanny A. V. ^[1] ; Mayer Alegre, Thiago P. ^[1] ; Wiederhecker, Gustavo S. ^[1]

Afiliação do(s) autor(es)

^[1] Univ Estadual Campinas, UNICAMP, Appl Phys Dept, Gleb Wataghin Phys Inst, BR-13083859 Campinas, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: Optics Express; v. 25, n. 25, p. 31347-31361, DEC 11 2017.
• Citações Web of Science: 1

Resumo

Elastic dissipation through radiation towards the substrate is a major loss channel in micro-and nanomechanical resonators. Engineering the coupling of these resonators with optical cavities further complicates and constrains the design of low-loss optomechanical devices. In this work we rely on the coherent cancellation of mechanical radiation to demonstrate material and surface absorption limited silicon near-field optomechanical resonators oscillating at tens of MHz. The effectiveness of our dissipation suppression scheme is investigated at room and cryogenic temperatures. While at room temperature we can reach a maximum quality factor of 7.61k (fQ-product of the order of 10(11) Hz), at 22 K the quality factor increases to 37k, resulting in a fQ-product of 2 x 10(12) Hz. (C) 2017 Optical Society of America under the terms of the OSA Open Access Publishing Agreement (AU)

• Processo FAPESP: 08/57857-2 - Fotônica para comunicações ópticas
• Beneficiário: Hugo Luis Fragnito
• Linha de fomento: Auxílio à Pesquisa - Temático
• Processo FAPESP: 12/17610-3 - Optomecânica em cristais fotônicos e fonônicos
• Beneficiário: Thiago Pedro Mayer Alegre
• Linha de fomento: Auxílio à Pesquisa - Apoio a Jovens Pesquisadores
• Processo FAPESP: 12/17765-7 - Nanofotônica em semicondutores do Grupo IV e III-V
• Beneficiário: Gustavo Silva Wiederhecker
• Linha de fomento: Auxílio à Pesquisa - Apoio a Jovens Pesquisadores