| Texto completo | |
| Autor(es): |
Chaves, Michel
[1]
;
Ramos, Raul
[1]
;
Martins, Everson
[1]
;
Rangel, Elidiane Cipriano
[1]
;
da Cruz, Nilson Cristino
[1]
;
Durrant, Steven Frederick
[1]
;
Ribeiro Bortoleto, Jose Roberto
[1]
Número total de Autores: 7
|
| Afiliação do(s) autor(es): | [1] Univ Estadual Paulista, UNESP, Inst Ciencia & Tecnol Sorocaba, Ave Tres Marco 511, BR-18087180 Sorocaba, SP - Brazil
Número total de Afiliações: 1
|
| Tipo de documento: | Artigo Científico |
| Fonte: | MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 22, n. 3 2019. |
| Citações Web of Science: | 1 |
| Resumo | |
Aluminum zinc oxide (AZO) thin films were synthesized on glass substrates by radio frequency (rf) magnetron sputtering from a metallic Zn-Al (5 at. %) target at room temperature. The morphological, structural, electrical and optical properties of the films were studied as a function of the sputtering pressure, which was varied from 0.1 to 6.7 Pa. X-ray diffraction (XRD) analyses revealed that the films obtained were polycrystalline, having a hexagonal wurtzite structure with a preferential orientation in the (002) plane. In addition, the crystallite size increased as a function of sputtering pressure. Owing to the re-sputtering of the Zn atoms from the growing film, the aluminum concentration presented a maximum value of 13 at. %. At pressures close to 0.16 Pa, we obtained films with values of electrical resistivity and mobility of 2.8 10(-3) Omega cm and 17 cm(2)/Vs, respectively. Finally, our results indicate that the structure zone diagram proposed by Thornton and later modified by Kluth does not fully predict the structural/morphological behavior of the AZO films, since plasma interactions must also be taken into account. With the methodology used, transparent conductive electrodes can be deposited on substrates at low temperatures. (AU) | |
| Processo FAPESP: | 14/21594-9 - Caracterização de superfícies cloradas a plasma e de filmes finos clorados depositados a plasma |
| Beneficiário: | Steven Frederick Durrant |
| Modalidade de apoio: | Auxílio à Pesquisa - Regular |
| Processo FAPESP: | 08/53311-5 - Síntese e integração de nanoestruturas, filmes finos e superfícies modificadas |
| Beneficiário: | José Roberto Ribeiro Bortoleto |
| Modalidade de apoio: | Auxílio à Pesquisa - Jovens Pesquisadores |