Stability of the Photocatalytic Activity of TiO2 Deposited by Reactive Sputtering

Autor(es)

Escaliante, Lucas Caniati ^[1] ; Rocha, Kleper de Oliveira ^[2] ; Dias da Silva, Jose Humberto ^[1]

Afiliação do(s) autor(es)

^[1] Univ Estadual Paulista UNESP, Fac Ciencias, Programa Pos Grad Ciencia & Tecnol Mat POSMAT, Bauru, SP - Brazil

^[2] Univ Estadual Paulista UNESP, Fac Ciencias, Dept Quim, Bauru, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 24, n. 1 2021.
• Citações Web of Science: 0

Resumo

The photocatalytic activity and stability of TiO2 thin films deposited by reactive sputtering were evaluated through many cycles of aqueous methylene blue solutions photodegradation. Tests were performed in TiO2 films deposited onto silica, silicon, and lanthanum aluminate substrates under UV light irradiation. The dye degradation was determined using the optical absorbance spectra at preestablished exposure times. After 16 cycles of reaction, 180 minutes each, no systematic losses in the photocatalytic activity were observed in the samples. The best activity was observed on films deposited onto silica glass. The results indicate that the TiO2 samples deposited by the sputtering technique are stable concerning the UV degradation of methylene blue. (AU)

• Processo FAPESP: 17/18916-2 - Otimização do Crescimento de Filmes de Co3O4 para Aplicações Fotovoltaicas e Fotocatalíticas
• Beneficiário: Jose Humberto Dias da Silva
• Modalidade de apoio: Auxílio à Pesquisa - Regular