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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Stability of the Photocatalytic Activity of TiO2 Deposited by Reactive Sputtering

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Author(s):
Escaliante, Lucas Caniati [1] ; Rocha, Kleper de Oliveira [2] ; Dias da Silva, Jose Humberto [1]
Total Authors: 3
Affiliation:
[1] Univ Estadual Paulista UNESP, Fac Ciencias, Programa Pos Grad Ciencia & Tecnol Mat POSMAT, Bauru, SP - Brazil
[2] Univ Estadual Paulista UNESP, Fac Ciencias, Dept Quim, Bauru, SP - Brazil
Total Affiliations: 2
Document type: Journal article
Source: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 24, n. 1 2021.
Web of Science Citations: 0
Abstract

The photocatalytic activity and stability of TiO2 thin films deposited by reactive sputtering were evaluated through many cycles of aqueous methylene blue solutions photodegradation. Tests were performed in TiO2 films deposited onto silica, silicon, and lanthanum aluminate substrates under UV light irradiation. The dye degradation was determined using the optical absorbance spectra at preestablished exposure times. After 16 cycles of reaction, 180 minutes each, no systematic losses in the photocatalytic activity were observed in the samples. The best activity was observed on films deposited onto silica glass. The results indicate that the TiO2 samples deposited by the sputtering technique are stable concerning the UV degradation of methylene blue. (AU)

FAPESP's process: 17/18916-2 - Optimization of the Growth Process of Co3O4 Films for Photovoltaic and Photocatalytic Applications
Grantee:Jose Humberto Dias da Silva
Support Opportunities: Regular Research Grants