A simplified two-resistance model for the description of melting curves obtained through differential scanning calorimetry

Autor(es)

Gonsalves, Rui Lopes ; Robustillo, Maria Dolores ; Pessoa Filho, Pedro de Alcantara

• Tipo de documento: Artigo Científico
• Fonte: Thermochimica Acta; v. 714, p. 13-pg., 2022-08-01.

Resumo

This paper presents a simplified approach to describe the melting endotherm obtained through differential scanning calorimetry. This description considers two main resistances to the heat transfer: the resistance from the heat source to the sample, and the resistance in the liquid layer formed during the melting. The approach was successfully applied to the modeling of melting endotherms of pure fatty esters obtained in the same apparatus using heating rates from 0.5 K???min??? 1 to 2.5 K???min??? 1. The external resistance can be considered constant and independent on the substance at low heating rates, whereas the parameter related to the resistance of the liquid layer may depend on the substance and the heating rate. The proposed two-resistance approach yielded an adequate description of the melting endotherm. (AU)

• Processo FAPESP: 18/06136-5 - EMU concedido no processo 2014/21252-0: equipamento de calorimetria exploratória diferencial com modulação e microscopia de reflexão acoplada da Mettler Toledo
• Beneficiário: Pedro de Alcântara Pessôa Filho
• Modalidade de apoio: Auxílio à Pesquisa - Programa Equipamentos Multiusuários