| Texto completo | |
| Autor(es): |
Campos, R. A.
;
Trava-Airoldi, V. J.
;
Bagnato, O. R.
;
Moro, J. R.
;
Corat, E. J.
Número total de Autores: 5
|
| Tipo de documento: | Artigo Científico |
| Fonte: | VACUUM; v. 89, p. 5-pg., 2013-03-01. |
| Resumo | |
A multistep growth and masking method allowed developing windows with controlled geometry inside a silicon frame. In this paper, we present a new method to produce nanocrystalline diamond windows with thickness of about 200 nm to 40 mu m, with different areas and shapes (circular, rectangular and rounded rectangle). The nanocrystalline diamond (NCD) films deposited on a silicon substrate (100) p-type, had a nucleation density of about 10(11) part/cm(2). Electrostatic self-assembly of nanodiamond seeds (4 nm powder) improved nucleation. Silicon anisotropic etching reveals the window geometry. The high nucleation density enabled smooth surfaces on both sides without the need for polishing the window. Pressure tests were performed in windows of varying thickness. The windows with thickness larger than 10 mu m supported a pressure gradient of 1 atm. (C) 2012 Elsevier Ltd. All rights reserved. (AU) | |
| Processo FAPESP: | 07/00013-4 - Novos materiais, estudos e aplicações inovadoras em diamante-CVD, diamond-like-carbon (DLC) e carbono nanoestruturado obtidos por deposição química a partir da fase vapor |
| Beneficiário: | Evaldo Jose Corat |
| Modalidade de apoio: | Auxílio à Pesquisa - Temático |