| Texto completo | |
| Autor(es): |
Merij, Abrao Chiaranda
[1]
;
Sugahara, Tarcila
[1]
;
Martins, Gislene Valdete
[2]
;
da Silva Sobrinho, Argemiro Soares
[2]
;
Pereira Reis, Danieli Aparecida
[2, 1]
;
Radi Goncalves, Polyana Alves
[3, 2]
;
Massi, Marcos
[2, 1]
Número total de Autores: 7
|
| Afiliação do(s) autor(es): | [1] UNIFESP, BR-12231280 Sao Jose Dos Campos, SP - Brazil
[2] ITA, DCTA, BR-12228900 Sao Jose Dos Campos, SP - Brazil
[3] UNIVAP, IP&D, BR-12244000 Sao Jose Dos Campos, SP - Brazil
Número total de Afiliações: 3
|
| Tipo de documento: | Artigo Científico |
| Fonte: | MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 18, n. 5, p. 904-907, SEP-OCT 2015. |
| Citações Web of Science: | 1 |
| Resumo | |
In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness. (AU) | |
| Processo FAPESP: | 11/50773-0 - Nucleo de excelencia em fisica e aplicacoes de plasmas. (fapesp-mct/cnpq-pronex-2011) |
| Beneficiário: | Ricardo Magnus Osório Galvão |
| Modalidade de apoio: | Auxílio à Pesquisa - Temático |