Use of Cr Inter layer to Promote the Adhesion of SIC Films Deposited on Ti-6Al-4V by HiPIMS

Autor(es)

Merij, Abrao Chiaranda ^[1] ; Sugahara, Tarcila ^[1] ; Martins, Gislene Valdete ^[2] ; da Silva Sobrinho, Argemiro Soares ^[2] ; Pereira Reis, Danieli Aparecida ^{[2, 1]} ; Radi Goncalves, Polyana Alves ^{[3, 2]} ; Massi, Marcos ^{[2, 1]}

Afiliação do(s) autor(es)

^[1] UNIFESP, BR-12231280 Sao Jose Dos Campos, SP - Brazil

^[2] ITA, DCTA, BR-12228900 Sao Jose Dos Campos, SP - Brazil

^[3] UNIVAP, IP&D, BR-12244000 Sao Jose Dos Campos, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 18, n. 5, p. 904-907, SEP-OCT 2015.
• Citações Web of Science: 1

Resumo

In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness. (AU)

• Processo FAPESP: 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas
• Beneficiário: Ricardo Magnus Osório Galvão
• Modalidade de apoio: Auxílio à Pesquisa - Temático