Use of Cr Inter layer to Promote the Adhesion of SIC Films Deposited on Ti-6Al-4V by HiPIMS

Author(s)

Merij, Abrao Chiaranda ^[1] ; Sugahara, Tarcila ^[1] ; Martins, Gislene Valdete ^[2] ; da Silva Sobrinho, Argemiro Soares ^[2] ; Pereira Reis, Danieli Aparecida ^{[2, 1]} ; Radi Goncalves, Polyana Alves ^{[3, 2]} ; Massi, Marcos ^{[2, 1]}

Affiliation

^[1] UNIFESP, BR-12231280 Sao Jose Dos Campos, SP - Brazil

^[2] ITA, DCTA, BR-12228900 Sao Jose Dos Campos, SP - Brazil

^[3] UNIVAP, IP&D, BR-12244000 Sao Jose Dos Campos, SP - Brazil

• Document type: Journal article
• Source: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 18, n. 5, p. 904-907, SEP-OCT 2015.
• Web of Science Citations: 1

Abstract

In this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness. (AU)

• FAPESP's process: 11/50773-0 - Center of excellence in physics and applications of plasmas
• Grantee: Ricardo Magnus Osório Galvão
• Support Opportunities: Research Projects - Thematic Grants