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Synthesis and microbiological analysis of polymer substrates coated with TiO2 and / or Al2O3 ultra-thin films by atomic layer deposition technology


Atomic layer deposition (ALD) has been shown to be an attractive technology to deposit thin films for many advanced applications from nanotechnology to biomedicine. This research project aims to investigate the growth and properties of atomic layer deposited titanium dioxide (TiO2) and/or aluminum oxide (Al2O3) thin films on polyurethane (PU), polydimethylsiloxane (PDMS) and polyvinyl chloride (PVC) substrates, and discusses their effect on the growth and inactivation process, in case of contamination, of the yeast of the genus Candida albicans. These substrates are often used in the synthesis of medical-hospital devices such as the long-term catheter, which may be susceptible to microbiological contamination. For these, the physical, chemical and antifungal assays will be evaluated. In the ALD process of the TiO2 film, TiCl4 and H2O will be used as precursors, whereas for the Al2O3 film, the Al(CH3)3 and H2O precursors will be used. All the processes will be carried out at a fixed temperature of 80 °C, while the number of the reaction cycle for film growth will be varied from 500 to 2000. The effect of the insertion of Al2O3 nanolayers on the TiO2 film will also be investigated. For biological analyses, yeasts of standards trains of C. albicans (ATCC 10231) will be grown on non-coated and coated substrates and then the antifungal and photocatalytic activities of the films will be investigated using colony-forming units (CFU) counts before and after UV-light treatment. Several chemical, physical and physical-chemistry techniques will be used to evaluate the growth kinetics, elemental composition, material structure, chemical bonds, contact angle, work of adhesion and surface morphology of the ALD thin films on both substrates. Finally, the development/construction of a cross-flow type ALD thermal reactor is proposed, as the researcher has acquired, in recent years, sufficient know-how in a commercial ALD machine (Beneq TFS-200, project FAPESP/PRONEX 2011/50773-0). This equipment will be developed considering a future treatment of three-dimensional substrates such as catheters. (AU)

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Scientific publications (11)
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
GALVAO, NIERLLY; VASCONCELOS, GETULIO; PESSOA, RODRIGO; MACHADO, JOAO; GUERINO, MARCIEL; FRAGA, MARIANA; RODRIGUES, BRUNO; CAMUS, JULIEN; DJOUADI, ABDOU; MACIEL, HOMERO. A Novel Method of Synthesizing Graphene for Electronic Device Applications. MATERIALS, v. 11, n. 7, . (11/50773-0, 18/01265-1, 14/18139-8, 17/18826-3)
TONELI, D. A.; PESSOA, R. S.; ROBERTO, M.; GUDMUNDSSON, J. T.. A global model study of low pressure high density CF4 discharge. PLASMA SOURCES SCIENCE & TECHNOLOGY, v. 28, n. 2, . (18/01265-1, 15/16471-8)
CHIAPPIM, WILLIAM; FRAGA, MARIANA AMORIM; MACIEL, HOMERO SANTIAGO; PESSOA, RODRIGO SAVIO. An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique. FRONTIERS IN MECHANICAL ENGINEERING-SWITZERLAND, v. 6, . (16/17826-7, 18/01265-1, 11/50773-0)
JUNIOR, ARMSTRONG GODOY; PEREIRA, ANDRE; GOMES, MARCILENE; FRAGA, MARIANA; PESSOA, RODRIGO; LEITE, DOUGLAS; PETRACONI, GILBERTO; NOGUEIRA, ADAILTON; WENDER, HEBERTON; MIYAKAWA, WALTER; et al. Black TiO2 Thin Films Production Using Hollow Cathode Hydrogen Plasma Treatment: Synthesis, Material Characteristics and Photocatalytic Activity. CATALYSTS, v. 10, n. 3, . (18/01265-1, 15/06241-5)
CHIAPPIM, WILLIAM; WATANABE, MARCOS; DIAS, VANESSA; TESTONI, GIORGIO; RANGEL, RICARDO; FRAGA, MARIANA; MACIEL, HOMERO; DOS SANTOS FILHO, SEBASTIAO; PESSOA, RODRIGO. MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion. NANOMATERIALS, v. 10, n. 2, . (18/01265-1, 15/05956-0, 11/50773-0, 15/10876-6, 16/17826-7)
GALVAO, NIERLLY; GUERINO, MARCIEL; CAMPOS, TIAGO; GRIGOROV, KORNELI; FRAGA, MARIANA; RODRIGUES, BRUNO; PESSOA, RODRIGO; CAMUS, JULIEN; DJOUADI, MOHAMMED; MACIEL, HOMERO. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering. MICROMACHINES, v. 10, n. 3, . (18/01265-1, 11/50773-0, 14/18139-8)
CHIAPPIM, WILLIAM; TESTONI, GIORGIO; MIRANDA, FELIPE; FRAGA, MARIANA; FURLAN, HUMBER; SARAVIA, DAVID ARDILES; SOBRINHO, ARGEMIRO DA SILVA; PETRACONI, GILBERTO; MACIEL, HOMERO; PESSOA, RODRIGO. Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating. MICROMACHINES, v. 12, n. 6, . (20/10450-7, 18/01265-1)
DE SOUZA, P. R. F.; SOUZA, G. C. C.; PINTO, J. V. F. A.; DORIA, A. C. O. C.; NASCIMENTO, L. M.; GOMES, M. C.; DA SILVA SOBRINHO, A. S.; PETRACONI, G.; SAGAS, J. C.; RODRIGUES, B. V. M.; et al. Effect of Ozone Exposure on Water Uptake and Germination of Lentil (Lens Culinaris) Seeds. OZONE-SCIENCE & ENGINEERING, v. 43, n. 1, p. 48-59, . (18/01265-1)
CHIAPPIM, WILLIAM; SAMPAIO, ALINE DA GRACA; MIRANDA, FELIPE; FRAGA, MARIANA; PETRACONI, GILBERTO; DA SILVA SOBRINHO, ARGEMIRO; KOSTOV, KONSTANTIN; KOGA-ITO, CRISTIANE; PESSOA, RODRIGO. ntimicrobial Effect of Plasma-Activated Tap Water on Staphylococcus aureus, Escherichia coli, and Candida albican. WATER, v. 13, n. 11, . (19/25652-7, 19/05856-7, 18/01265-1, 20/10450-7)
DIAS, V. M.; CHIAPPIM, W.; FRAGA, M. A.; MACIEL, H. S.; MARCIANO, F. R.; PESSOA, R. S.. Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage. MATERIALS RESEARCH EXPRESS, v. 7, n. 7, . (18/01265-1, 14/18139-8, 16/17826-7)
DIAS, VANESSA; MACIEL, HOMERO; FRAGA, MARIANA; LOBO, ANDERSON O.; PESSOA, RODRIGO; MARCIANO, FERNANDA R.. Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application. MATERIALS, v. 12, n. 4, . (14/18139-8, 11/50773-0, 11/17877-7, 12/15857-1, 11/20345-7, 16/00575-1, 15/05956-0, 15/09697-0, 18/01265-1, 15/10876-6)

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