Structural and optical properties of a-C: H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition

Autor(es)

Fernandes, Isabela Cristina ^[1] ; Hadich, Tayan Vieira ^[1] ; Manosso Amorim, Milena Kowalczuk ^[1] ; Turri, Rafael Gustavo ^[1] ; Rangel, Elidiane C. ^[1] ; Dias da Silva, Jose Humberto ^[2] ; Durrant, Steven F. ^[1]

Afiliação do(s) autor(es)

^[1] Univ Estadual Paulista, UNESP, Inst Ciencia & Tecnol Sorocaba, Lab Plasmas Tecnol, Av Tres de Marco 511, BR-18087180 Sorocaba, SP - Brazil

^[2] UNESP, Dept Fis, Lab Filmes Semicond, Fac Ciencias, Bauru, SP - Brazil

• Tipo de documento: Artigo Científico
• Fonte: Materials Chemistry and Physics; v. 214, p. 277-284, AUG 1 2018.
• Citações Web of Science: 0

Resumo

Amorphous hydrogenated oxygenated chlorinated carbon materials with and without silicon were produced by PECVD at deposition rates of up to 150 nm min(-1). Surface roughness, morphology and contact angle were almost independent of the main system parameter, namely the partial pressure of CHCl3 in the plasma feed, C-cl. Infrared reflection absorption spectroscopy (IRRAS) of the films revealed the presence of C=O and C=C bonding in all the chlorinated films. IRRAS spectra also showed the presence of C-Cl bonds in the most chlorinated a-C:H:O:Cl films. Hydration of Si-CI to Si-OH occurs in the a-C:H:Si:O:Cl films. As revealed by Energy-dispersive X-ray spectroscopy (EDS) the Cl content increases and the O content decreases as C-cl increases. Under the range of conditions used, {[}Cl] reached maxima of similar to 32 at.% and 25 at.%, respectively, for the series of a-C:H:O:Cl and the a-C:H:Si:O:C1 films. For the aC:H:Si:O:Cl films the Si content decreases with increasing Ca. Optical properties were calculated from Ultraviolet-visible near infrared spectral data. Refractive indices varied between-1.52 and 1.78, depending on Co. The Tauc gaps can be selected by a suitable choice of Ca in the range of roughly 13-2.6 eV. (C) 2018 Elsevier B.V. All rights reserved. (AU)

• Processo FAPESP: 14/21594-9 - Caracterização de superfícies cloradas a plasma e de filmes finos clorados depositados a plasma
• Beneficiário: Steven Frederick Durrant
• Modalidade de apoio: Auxílio à Pesquisa - Regular