Electron beam irradiation for the formation of thick Ag film on Ag3PO4

Autor(es)

de Campos da Costa, Joao Paulo ^{[1, 2]} ; Assis, Marcelo ^[1] ; Teodoro, Vinicius ^[1] ; Rodrigues, Andre ^[3] ; de Foggi, Camila Cristina ^[1] ; San-Miguel, Miguel Angel ^[3] ; Pereira do Carmo, Joao Paulo ^{[2, 4]} ; Andres, Juan ^[5] ; Longo, Elson ^[1]

Afiliação do(s) autor(es)

^[1] Fed Univ Sao Carlos UFSCar, Dept Chem, CDMF, INCTMN, BR-13565905 Sao Carlos - Brazil

^[2] Univ Sao Paulo, Dept Elect Engn SEL, BR-13566590 Sao Carlos - Brazil

^[3] State Univ Campinas UNICAMP, Inst Chem, Dept Phys Chem, BR-13083970 Campinas, SP - Brazil

^[4] Univ Minho, R&D Ctr MicroElectroMech CMEMS, Campus Azurem, P-4800052 Guimaraes - Portugal

^[5] Univ Jaume I UJI, Dept Analyt & Phys Chem, Castellon de La Plana 12071 - Spain

• Tipo de documento: Artigo Científico
• Fonte: RSC ADVANCES; v. 10, n. 37, p. 21745-21753, JUN 9 2020.
• Citações Web of Science: 0

Resumo

This study demonstrates that the electron beam irradiation of materials, typically used in characterization measurements, could be employed for advanced fabrication, modification, and functionalization of composites. We developed irradiation equipment using an electron beam irradiation source to be applied in materials modification. Using this equipment, the formation of a thick Ag film on the Ag(3)PO(4)semiconductor is carried out by electron beam irradiation for the first time. This is confirmed by various experimental techniques (X-ray diffraction, field-emission scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy) andab initiomolecular dynamics simulations. Our calculations demonstrate that, at the earlier stages, metallic Ag growth is initiated preferentially at the (110) surface, with the reduction of surface Ag cations forming metallic Ag clusters. As the (100) and (111) surfaces have smaller numbers of exposed Ag cations, the reductions on these surfaces are slower and are accompanied by the formation of O(2)molecules. (AU)

• Processo FAPESP: 19/18656-6 - Desenvolvimento de sistema de irradiação por feixe de elétrons e sua aplicação na modificação de materiais semicondutores
• Beneficiário: João Paulo de Campos da Costa
• Modalidade de apoio: Bolsas no Brasil - Doutorado
• Processo FAPESP: 13/07296-2 - CDMF - Centro de Desenvolvimento de Materiais Funcionais
• Beneficiário: Elson Longo da Silva
• Modalidade de apoio: Auxílio à Pesquisa - Centros de Pesquisa, Inovação e Difusão - CEPIDs
• Processo FAPESP: 16/23891-6 - Modelagem computacional da matéria condensada
• Beneficiário: Alex Antonelli
• Modalidade de apoio: Auxílio à Pesquisa - Temático