Comparison of RF and Pulsed Magnetron Sputtering for the Deposition of AZO Thin Films on PET

Autor(es)

L. P. G. Oliveira ^[1] ; R. Ramos ^[2] ; W. H. Rabelo ^[3] ; E. C. Rangel ^[4] ; Steven F. Durrant ^[5] ; J. R. R. Bortoleto ^[6]

Afiliação do(s) autor(es)

^[1] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

^[2] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

^[3] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

^[4] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

^[5] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

^[6] Universidade Estadual Paulista. Instituto de Ciência e Tecnologia de Sorocaba - Brasil

• Tipo de documento: Artigo Científico
• Fonte: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 23, n. 3 2020-07-22.

Resumo

AZO thin films (around 200 nm thick) were grown on polyethylene terephthalate (PET) at room temperature. The plasma was activated using a 13.56 MHz (RF) or a 15 kHz pulsed (PMS) source at a power of 60 W. Optical reflection and transmittance were measured using a UV-Vis-NIR spectrometer over the wavelengths from 190 nm to 2500 nm. All samples show average transmittances greater than 83% in the visible region. The electrical resistivity was measured by the linear four-point probe method to be around 0.001 Ωcm for 200 nm-thick AZO films grown by PMS. XRD results indicated that the films had a hexagonal wurtzite structure and were preferentially oriented in the (002) plane. The surface morphology of the AZO thin films was characterized using Scanning Electron Microscopy (SEM); film chemical composition was studied using Energy Dispersive X-ray Spectroscopy (EDS). For this, an EDS coupled to the Scanning Electron Microscope was used. Only for films grown by PMS were no cracks observed. (AU)

• Processo FAPESP: 17/15853-0 - Caracterização de Filmes Finos Complexos Obtidos por PECVD e a Deposição de Filmes Finos em Substratos Porosos
• Beneficiário: Steven Frederick Durrant
• Modalidade de apoio: Auxílio à Pesquisa - Regular