| Texto completo | |
| Autor(es): |
Marques, Vagner Eduardo Caetano
;
Manfroi, Lucas Augusto
;
Vieira, Angela Aparecida
;
Pereira, Andre Luis de Jesus
;
Marques, Francisco das Chagas
;
Vieira, Lucia
Número total de Autores: 6
|
| Tipo de documento: | Artigo Científico |
| Fonte: | COATINGS; v. 13, n. 4, p. 12-pg., 2023-04-01. |
| Resumo | |
Titanium dioxide (TiO2) thin films are widely used in transparent optoelectronic devices due to their excellent properties, as well as in photocatalysis, cosmetics, and many other biomedical applications. In this work, TiO2 thin films were deposited onto AISI 304 and AISI 316L stainless steel substrates by atomic layer deposition, followed by comparative evaluation of the mixture of anatase and rutile phase by X-ray diffraction, Raman maps, morphology by SEM-FEG-AFM, and adhesion of the films on the two substrates, aiming to evaluate the scratch resistance. Raman spectroscopy mapping and X-ray diffraction with Rietveld refinement showed that the films were composed of anatase and rutile phases, in different percentages. Scratch testing using a diamond tip on the TiO2 film was employed to evaluate the film adherence and to determine the friction coefficient, with the results showing satisfactory adherence of the films on both substrates. (AU) | |
| Processo FAPESP: | 11/50773-0 - Núcleo de excelência em física e aplicações de plasmas |
| Beneficiário: | Ricardo Magnus Osório Galvão |
| Modalidade de apoio: | Auxílio à Pesquisa - Temático |