Simulation and Fabrication of Silicon Nitride Microring Resonator by DUV Lithography

Autor(es)

Cirino, Giuseppe A. ; Barea, Luis A. ; von Zuben, Antonio A. ; L'hermite, Herve ; Beche, Bruno ; De Sagazan, Olivier ; Frateschi, Newton ; M-Brahim, Tayeb ; IEEE

• Tipo de documento: Artigo Científico
• Fonte: 2016 31ST SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO); v. N/A, p. 4-pg., 2016-01-01.

Resumo

This work reports the design and fabrication of silicon nitride-based microresonators by employing DUV optical lithography and ICP-RIE plasma etching. Microring devices with high Q factors provide high sensitivity and low detection limit, enabling their use in biochemical sensing applications. With these properties, the devices can be used to detect and quantify the biomolecules present in a homogeneous solution, by detecting an effective refractive index change, without using fluorescent labels. (AU)

• Processo FAPESP: 14/04748-2 - Microcavidades acopladas aplicadas ao processamento de sinais e integração fotônica
• Beneficiário: Mário César Mendes Machado de Souza
• Modalidade de apoio: Bolsas no Brasil - Doutorado
• Processo FAPESP: 08/57862-6 - NAMITEC
• Beneficiário: Jacobus Willibrordus Swart
• Modalidade de apoio: Auxílio à Pesquisa - Temático