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Analog behavior of forksheet FET at high temperatures☆

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Autor(es):
Martino, Joao Antonio ; Agopian, Paula Ghedini Der ; de Paula, Julius Andretti Peixoto Pires ; Ritzenthaler, Romain ; Mertens, Hans ; Veloso, Anabela ; Horiguchi, Naoto
Número total de Autores: 7
Tipo de documento: Artigo Científico
Fonte: Solid-State Electronics; v. 227, p. 4-pg., 2025-04-24.
Resumo

This work presents an experimental study of the analog behavior of forksheet FET from room up to 150 degrees C with channel lengths of 26 and 70 nm. These devices present a Zero Temperature-Coefficient (ZTC) point for a gate voltage around 0,59 V (VZTC) in saturation region. The threshold voltage variation with temperature (dVT/dT) is around - 0,5mV/oC due to the Fermi level decrease. The DIBL increases with temperature but it is kept lower than 51 mV/V in the studied temperature range. The transconductance and output conductance decrease (mainly due the mobility degradation) which results in a good intrinsic voltage gain of around 36 dB at room temperature, showing a slight change (+/- 2dB) in the studied temperature range. The maximum unity gain frequency estimated for L = 26 nm is around 358 GHz in strong inversion regime. The results show that the forksheet FETs present a good performance for analog applications at high temperature, which in addition to the already known savings in footprint area compared to nanosheet technology, are potentially useful for future mixed-signal integrated circuits. (AU)

Processo FAPESP: 20/04867-2 - Física e instrumentação de altas energias com o LHC-CERN
Beneficiário:Marcelo Gameiro Munhoz
Modalidade de apoio: Auxílio à Pesquisa - Projetos Especiais