| Texto completo | |
| Autor(es): |
Lima, F. Crasto de
;
Miwa, Roberto H.
;
Lewenkopf, Caio
;
Fazzio, Adalberto
Número total de Autores: 4
|
| Tipo de documento: | Artigo Científico |
| Fonte: | PHYSICAL REVIEW B; v. 111, n. 19, p. 7-pg., 2025-05-19. |
| Resumo | |
We investigate the robustness of virtual topological states-topological phases away from the Fermi energy- against the electron-electron interaction and band filling. As a case study, we employ a realistic model to investigate the properties of vacancy-driven topological phases in transition metal dichalcogenides (TMDs) and establish a connection between the degree of localization of topological wave functions, the vacancy density, and the electron-electron interaction strength with the topological phase robustness. We demonstrate that electron-electron interactions play a crucial role in degrading topological phases thereby determining the validity of single-particle approximations for topological insulator phases. Our findings can be naturally extended to virtual topological phases of a wide range of materials. (AU) | |
| Processo FAPESP: | 23/09820-2 - Design de materiais: dos materiais quânticos às aplicações em energia |
| Beneficiário: | Gustavo Martini Dalpian |
| Modalidade de apoio: | Auxílio à Pesquisa - Temático |