Layout and material gradation in topology optimization of functionally graded structures: a global-local approach

Autor(es)

Almeida, Sylvia R. M. ^[1] ; Paulino, Glaucio H. ^{[2, 3]} ; Silva, Emilio C. N. ^[4]

Afiliação do(s) autor(es)

^[1] Univ Fed Goias, Escola Engn Civil, BR-74605220 Goiania, Go - Brazil

^[2] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 - USA

^[3] Univ Illinois, Newmark Lab, Dept Civil & Environm Engn, Urbana, IL 61801 - USA

^[4] Univ Sao Paulo, Dept Mechatron & Mech Syst Engn, Escola Politecn, BR-05508900 Sao Paulo - Brazil

• Tipo de documento: Artigo Científico
• Fonte: STRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION; v. 42, n. 6, p. 855-868, DEC 2010.
• Citações Web of Science: 35

Resumo

By means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials. (AU)

• Processo FAPESP: 08/51070-0 - Gláucio Hermogenes Paulino | University of Illinois at Urbana Champaign - Estados Unidos
• Beneficiário: Emílio Carlos Nelli Silva
• Modalidade de apoio: Auxílio à Pesquisa - Pesquisador Visitante - Internacional
• Processo FAPESP: 06/57805-7 - Desenvolvimento de nanoposicionadores e micromanipuladores piezeletricos.
• Beneficiário: Emílio Carlos Nelli Silva
• Modalidade de apoio: Auxílio à Pesquisa - Regular