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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Layout and material gradation in topology optimization of functionally graded structures: a global-local approach

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Author(s):
Almeida, Sylvia R. M. [1] ; Paulino, Glaucio H. [2, 3] ; Silva, Emilio C. N. [4]
Total Authors: 3
Affiliation:
[1] Univ Fed Goias, Escola Engn Civil, BR-74605220 Goiania, Go - Brazil
[2] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 - USA
[3] Univ Illinois, Newmark Lab, Dept Civil & Environm Engn, Urbana, IL 61801 - USA
[4] Univ Sao Paulo, Dept Mechatron & Mech Syst Engn, Escola Politecn, BR-05508900 Sao Paulo - Brazil
Total Affiliations: 4
Document type: Journal article
Source: STRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION; v. 42, n. 6, p. 855-868, DEC 2010.
Web of Science Citations: 35
Abstract

By means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials. (AU)

FAPESP's process: 08/51070-0 - Gláucio Hermogenes Paulino | University of Illinois at Urbana Champaign - Estados Unidos
Grantee:Emílio Carlos Nelli Silva
Support Opportunities: Research Grants - Visiting Researcher Grant - International