Study of roughness evolution and layer stacking faults in short-period atomic layer deposited HfO2/Al2O3 multilayers

Autor(es)

de Pauli, M. ^{[1, 2]} ; Malachias, A. ^[2] ; Westfahl, Jr., H. ^[2] ; Bettini, J. ^[2] ; Ramirez, A. ^[2] ; Huang, G. S. ^{[3, 4]} ; Mei, Y. F. ^{[3, 4]} ; Schmidt, O. G. ^[3]

Afiliação do(s) autor(es)

^[1] Univ Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083859 Campinas, SP - Brazil

^[2] Lab Nacl Luz Sincrotron, BR-13083970 Campinas, SP - Brazil

^[3] IFW Dresden, Inst Integrat Nanosci, D-01069 Dresden - Germany

^[4] Fudan Univ, Dept Mat Sci, Shanghai 200433 - Peoples R China

• Tipo de documento: Artigo Científico
• Fonte: Journal of Applied Physics; v. 109, n. 6 MAR 15 2011.
• Citações Web of Science: 5

Resumo

In this work we study the evolution of roughness in interfaces of HfO2/Al2O3 multilayers by x-ray reflectivity. It was found that, besides the reduced adatom surface mobility during atomic layer deposition, an improvement of the interface quality can be achieved upon the stacking of several layers. Although the low roughness of the initial surface could not be recovered, there was a considerable improvement of surface/interface quality along the deposition process. In particular, variations on the growth temperature were not able to tailor the surface quality, if compared to the stacking process. Finally, transmission electron microscopy analysis has shown that local defects can take place among nearly perfect interfaces. Such effect must be taken into account for nanometer-scale device fabrication. (C) 2011 American Institute of Physics. {[}doi:10.1063/1.3555624] (AU)

• Processo FAPESP: 09/11875-2 - Estudo da ordem de longo alcance e propriedades termodinâmicas de multicamadas de ácidos fosfônicos pela técnica de difração de raios-X dispersiva em energia
• Beneficiário: Muriel de Pauli
• Modalidade de apoio: Bolsas no Brasil - Mestrado
• Processo FAPESP: 09/09027-3 - Estudo do crescimento, cristalização e estrutura da superfície em filmes finos, multicamadas e nanoestruturas formadas pelo método de deposição de monocamadas atômicas
• Beneficiário: Angelo Malachias de Souza
• Modalidade de apoio: Auxílio à Pesquisa - Jovens Pesquisadores