Advanced search
Start date
(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Study of roughness evolution and layer stacking faults in short-period atomic layer deposited HfO2/Al2O3 multilayers

Full text
de Pauli, M. [1, 2] ; Malachias, A. [1] ; Westfahl, Jr., H. [1] ; Bettini, J. [1] ; Ramirez, A. [1] ; Huang, G. S. [3, 4] ; Mei, Y. F. [4, 3] ; Schmidt, O. G. [3]
Total Authors: 8
[1] Lab Nacl Luz Sincrotron, BR-13083970 Campinas, SP - Brazil
[2] Univ Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083859 Campinas, SP - Brazil
[3] IFW Dresden, Inst Integrat Nanosci, D-01069 Dresden - Germany
[4] Fudan Univ, Dept Mat Sci, Shanghai 200433 - Peoples R China
Total Affiliations: 4
Document type: Journal article
Source: Journal of Applied Physics; v. 109, n. 6 MAR 15 2011.
Web of Science Citations: 5

In this work we study the evolution of roughness in interfaces of HfO2/Al2O3 multilayers by x-ray reflectivity. It was found that, besides the reduced adatom surface mobility during atomic layer deposition, an improvement of the interface quality can be achieved upon the stacking of several layers. Although the low roughness of the initial surface could not be recovered, there was a considerable improvement of surface/interface quality along the deposition process. In particular, variations on the growth temperature were not able to tailor the surface quality, if compared to the stacking process. Finally, transmission electron microscopy analysis has shown that local defects can take place among nearly perfect interfaces. Such effect must be taken into account for nanometer-scale device fabrication. (C) 2011 American Institute of Physics. {[}doi:10.1063/1.3555624] (AU)

FAPESP's process: 09/11875-2 - Energy dispersive diffraction study of long range ordering and thermodynamic properties of phosphonic acid multilayers
Grantee:Muriel de Pauli
Support type: Scholarships in Brazil - Master
FAPESP's process: 09/09027-3 - Study of growth, crystallization and surface structure of thin films, multilayers and nanostructures obtained by the atomic layer deposition method
Grantee:Angelo Malachias de Souza
Support type: Research Grants - Young Investigators Grants